IP Library Granted Patent US 7,947,952
Granted Patent B1
US 7,947,952 · App. 11/728,744 · Granted May 24, 2011

Nanomachining method and apparatus

Assignee: General Nanotechnology LLC
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Quick Facts
Patent No.
US 7,947,952
App. No.
11/728,744
Granted
May 24, 2011
Kind
B1
Abstract

Methods and apparatus are disclosed for nanomachining operations. Excitation energy settings are provided to minimize machine induced scan cutting. Cut operations can be operated in a feedback mode to provide controlled cutting operations. Measurement and sweep techniques to facilitate nanomachining operations are disclosed.

Claims (32)

1. In a nanomachining system having an SPM scanning probe and a translation apparatus coupled to provide translational motion of the SPM scanning probe, a method for moving material in a region of a workpiece, the method comprising:

performing one or more cut operations on a region of a workpiece, the one or more cut operations producing a deposit of debris in the region of the workpiece; and

removing the deposit of debris entirely from the region of the workpiece to another location including performing steps of:

(a) positioning the SPM scanning probe at a sweep-start position in the region of the workpiece, the sweep-start position lying on a first reference line;

(b) adjusting the SPM scanning probe along the Z-direction to a first Z-direction position;

(c) moving a first portion of the deposit of debris in a direction substantially orthogonal to the first reference line by translating the SPM scanning probe in a direction substantially orthogonal to the first reference line on which the sweep-start position lies; and

(d) moving additional portions of the deposit of debris by repeating steps (a)-(c) using additional sweep-start positions along the first reference line and by adjusting the Z-direction position of the SPM scanning probe.

2. The method of claim 1 wherein the region is a region being nanomachined.

3. The method of claim 1 wherein, in step (c), the scanning probe moves away from the sweep-start position along a substantially straight line of motion.

4. The method of claim 1 wherein, in step (c), the scanning probe moves away from the sweep-start position along a line of motion having a zig-zag pattern.

5. The method of claim 1 further comprising:

(e) moving still further additional portions of the deposit of debris in a direction substantially orthogonal to a second reference line by positioning the SPM scanning probe at a sweep-start position lying on the second reference line and performing steps (a)-(d) for the second reference line.

6. A nanomachining system comprising:

an SPM scanning probe;

a translation apparatus coupled to the SPM scanning probe to provide translational motion of the SPM scanning probe;

a controller coupled to operate the translation apparatus, the controller configured to:

perform one or more cut operations on a region of a workpiece, the one or more cut operations producing a deposit of debris in the region of the workpiece; and

remove the deposit of debris entirely from the region of the workpiece to another location including performing steps of:

(a) positioning the SPM scanning probe at a sweep-start position in a region of the workpiece, the sweep-start position lying on a first reference line, the first reference line being one among a plurality of reference lines passing through a common point of origin in the region;

(b) adjusting the SPM scanning probe along the Z-direction to a first Z-direction position;

(c) moving a first portion of the deposit of debris in a direction substantially orthogonal to the first reference line by translating the SPM scanning probe in a direction substantially orthogonal to the first reference line on which the sweep-start position lies; and

(d) moving additional portions of the deposit of debris by repeating (a)-(c) using additional sweep-start positions along the first reference line and by adjusting the Z-direction position of the SPM scanning probe.

7. The nanomachining system of claim 6 wherein the controller is further configure to move still further additional portions of the deposit of debris in a direction substantially orthogonal to a second reference line by positioning the SPM scanning probe at a sweep-start position lying on the second reference line and performing (a)-(d) for the second reference line.

8. A computer-program product embodied on a tangible computer-readable storage medium comprising program code configured to cause a computerized controller to operate an SPM scanning probe, the computer program code comprising:

first computer instructions which, when executed by the computerized controller, cause the computerized controller to:

perform one or more cut operations on are ion of a workpiece, the one or more cut operations producing a deposit of debris in the region of the workpiece; and

remove the deposit of debris entirely from the region of the workpiece to another location including performing steps of:

(a) positioning the SPM scanning probe at a sweep-start position in a region of the workpiece, the sweep-start position lying on a first reference line, the first reference line being one among a plurality of reference lines passing through a common point of origin in the region;

(b) adjusting the SPM scanning probe along the Z-direction to a first Z-direction position;

(c) moving a first portion of the deposit of debris in a direction substantially orthogonal to the first reference line by translating the SPM scanning probe in a direction substantially orthogonal to the first reference line on which the sweep-start position lies; and

(d) moving additional portions of the deposit of debris by repeating (a)-(c) using additional sweep-start positions along the first reference line and by adjusting the Z-direction position of the SPM scanning probe.

9. The computer-program product of claim 8 wherein the second first computer instructions which, when executed by the computerized controller, further cause the computerized controller to move still further additional portions of the deposit of debris in a direction substantially orthogonal to a second reference line by positioning the SPM scanning probe at a sweep-start position lying on the second reference line and performing (a)-(d) for the second reference line.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 10, 2012
From: GENERAL NANOTECHNOLOGY LLC
To: TERRASPAN LLC
Reel/Frame 027508/0567 →
Continuity (3)
Continuation 10093842 · Mar 7, 2002
Provisional Application 60287677 · Apr 30, 2001
Provisional Application 60274501 · Mar 8, 2001