IP Library Granted Patent US 8,089,614
Granted Patent B2
US 8,089,614 · App. 11/755,361 · Granted Jan 3, 2012

Device for changing pitch between light beam axes, and substrate exposure apparatus

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Quick Facts
Patent No.
US 8,089,614
App. No.
11/755,361
Granted
Jan 3, 2012
Kind
B2
Abstract

A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.

Claims (27)

1. A device for changing a pitch between light beam axes to reduce a pitch Px of parallel light beams emitted from light sources to another desired pitch Px′ in an x direction on which are arranged in the x direction and y direction in a shifted manner in the y direction, comprising:

a first transparent member in the shape of a prism whose cross section in the x-z direction is a parallelogram and whose height perpendicular to the cross section is higher than the sum of the distance in the y direction between the most distant light sources and the diameter of said parallel light beam; and

second transparent members, the number of which is one less than the number in the x direction of said light sources, in the shape of a prism, wherein each of the second transparent members has a cross section in the x-z direction that is a similar parallelogram to that of the first transparent member with the same interior angles, a side in the x direction that is Px-Px′ in length and a height perpendicular to the cross section that is higher than the sum of the distance in the y direction between the most distance light sources and the diameter of said parallel light beam, each of the second transparent members including the same number of grooves as the number in the y direction of said light sources formed in an oblique surface of each of the second transparent members which is the surface corresponding to the side adjacent to said side of Px-Px′ in length,

the first transparent member and the second transparent members being stacked so that said oblique surface of one of the second transparent members is in direct contact with the oblique surface of the first transparent member and the surface corresponding to said side of Px-Px′ in length of the second transparent members lies in one plane with the surface adjacent to said oblique surface of the first transparent member,

wherein light trying to enter one of the grooves undergoes total reflection by the one groove.

2. The device for changing a pitch between light beam axes according claim 1 ,

wherein one of interior angles of the parallelogram is 45 degrees.

3. A substrate exposure apparatus in which a spacing between optical axes of parallel beams on one side is changed by a device for changing a pitch between light beam axes, the parallel beams being outputted from a plurality of light sources arranged in a matrix and having optical axes that are spaced equidistant from each other, and in which light beams outputted from the light sources are radiated onto a target exposure substrate, comprising:

the device for changing a pitch between light beam axes according to claim 2 .

4. The device for changing a pitch between light beam axes according to claim 1 ,

wherein the first transparent member and the second transparent members are made of glass.

5. The device for changing a pitch between light beam axes according to claim 4 ,

wherein the first transparent member and the second transparent members are in direct contact with each other by optical contact.

6. A substrate exposure apparatus in which a spacing between optical axes of parallel beams on one side is changed by a device for changing a pitch between light beam axes, the parallel beams being outputted from a plurality of light sources arranged in a matrix and having optical axes that are spaced equidistant from each other, and in which light beams outputted from the light sources are radiated onto a target exposure substrate, comprising:

device for changing a pitch between light beam axes according to claim 5 .

7. The device for changing a pitch between light beam axes according to claim 4 ,

wherein the glass includes silica as its main component.

8. A substrate exposure apparatus in which a spacing between optical axes of parallel beams on one side is changed by a device for changing a pitch between light beam axes, the parallel beams being outputted from a plurality of light sources arranged in a matrix and having optical axes that are spaced equidistant from each other, and in which light beams outputted from the light sources are radiated onto a target exposure substrate, comprising:

device for changing a pitch between light beam axes according to claim 7 .

9. A substrate exposure apparatus in which a spacing between optical axes of parallel beams on one side is changed by a device for changing a pitch between light beam axes, the parallel beams being outputted from a plurality of light sources arranged in a matrix and having optical axes that are spaced equidistant from each other, and in which light beams outputted from the light sources are radiated onto a target exposure substrate, comprising:

the device for changing a pitch between light beam axes according to claim 4 .

10. A substrate exposure apparatus in which a spacing between optical axes of parallel beams on one side is changed by a device for changing a pitch between light beam axes, the parallel beams being outputted from a plurality of light sources arranged in a matrix and having optical axes that are spaced equidistant from each other, and in which light beams outputted from the light sources are radiated onto a target exposure substrate, comprising:

the device for changing a pitch between light beam axes according to claim 1 .

device for changing a pitch between light beam axes according to claim 7 .

11. The device for changing a pitch between light beam axes according to claim 1 , wherein all of the second transparent members are the same size.

12. The device for changing a pitch between light beam axes according to claim 1 , wherein the grooves are offset from each other in adjacent second transparent members.

13. The device for changing a pitch between light beam axes according to claim 1 , wherein the first transparent member and the second transparent members being stacked in the x direction.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 22, 2018
From: VIA MECHANICS, LTD.
To: ADTEC ENGINEERING CO., LTD.
Reel/Frame 047412/0658 →
CHANGE OF NAME Recorded Apr 3, 2014
From: HITACHI VIA MECHANICS, LTD.
To: VIA MECHANICS, LTD.
Reel/Frame 032600/0580 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SPELLING OF THE FIRST NAME OF THE THIRD ASSIGNOR'S PREVIOUSLY RECORDED ON REEL 019618 FRAME 0431. Recorded Jan 8, 2008
From: OSHIDA, YOSHITADA; NAITO, YOSHITATSU; SUZUKI, MITSUHIRO; YAMAGUCHI, TSUYOSHI; MURAYAMA, SHIGENOBU
To: HITACHI VIA MECHANICS, LTD.
Reel/Frame 020338/0174 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2007
From: OSHIDA, YOSHITADA; NAITO, YOSHITATSU; SUZUKI, MITUHIRO; YAMAGUCHI, TSUYOSHI; MARUYAMA, SHIGENOBU
To: HITACHI VIA MECHANICS, LTD.
Reel/Frame 019618/0431 →