Structure and method to gain substantial reliability improvements in lead-free BGAs assembled with lead-bearing solders
View Patent ↗Methods of forming and assemblies having hybrid interconnection grid arrays composed of a homogenous mixture of Pb-free solder joints and Pb-containing solder paste on corresponding sites of a printed board. The aligned Pb-free solder joints and Pb-containing solders are heated to a temperature above a melting point of the Pb-free solder joint for a sufficient time to allow complete melting of both the Pb-free solder joints and Pb-containing solder paste and the homogenous mixing thereof during assembly. These molten materials mix together such that the Pb from the Pb-containing solder disperses throughout substantially the entire Pb-free solder joint for complete homogenization of the molten materials to form the homogenous hybrid interconnect structures of the invention.
1. A method of forming an interconnect structure comprising:
providing a lead free solder joint;
providing a lead-containing solder;
aligning said lead free solder joint with said lead-containing solder;
heating said aligned lead free solder joint and lead-containing solder to a temperature above a melting point of said lead free solder joint for a sufficient time to allow for complete homogenization of said lead free solder joint with said lead-containing solder to form a homogenous hybrid interconnect structure having a configuration characterized by having no distinct regions of said lead free solder joint and said lead-containing solder.
2. The method of claim 1 wherein said lead free solder joint comprises a material selected from the group consisting of Sn—Ag (SA), Sn—Ag—Sb, Sn—Ag—Bi, Sn—Ag—Cu (SAC), Sn—Ag—Cu—Sb, Sn—Ag—Cu—Bi, Sn—Ag—Bi—Sb, Sn—Cu (SC), Sn—Cu—Sb, Sn—Cu—Bi, Sn—Ag—Cu—Sb—Bi or combinations thereof.
3. The method of claim 1 wherein said lead free solder joint comprises a material selected from the group consisting of Sn—Zn, Sn—Zi—Bi, Sn—In, Sn—Bi, Sn—Ag—In, Sn—Ag—In—Cu or combinations thereof.
4. The method of claim 1 wherein said lead-containing solder is selected from the group consisting of a lead-containing solder paste, a lead-containing solder paste with organic flux, or a lead-containing solder paste without organic flux.
5. The method of claim 1 wherein said lead-containing solder comprises a tin-lead paste.
6. The method of claim 1 wherein said temperature ranges from about 175° C. to about 260° C.
7. The method of claim 6 wherein said sufficient time ranges from about 1 minute to about 4 minutes.
8. A method of forming an interconnection grid array structure comprising:
providing an interconnection grid array of lead free solder joints;
providing an array of lead-containing solder, said array of lead-containing solder corresponding to said interconnection grid array of lead free solder joints;
aligning said interconnection grid array of lead free solder joints with said array of lead-containing solder; and
heating said aligned interconnection grid array of lead free solder joints and said array of lead-containing solder to a temperature above a melting point of said lead free solder joints for a sufficient time to allow for complete melting and mixing together of said interconnection grid array of lead free solder joints and said array of lead-containing solder such that lead from said lead-containing solder disperses throughout said interconnection grid array of lead free solder joints to form a homogenous hybrid interconnect grid array having improved, reliable levels of thermo-mechanical fatigue and characterized by having no distinct regions of said lead free solder joint and said lead-containing solder.
9. The method of claim 8 wherein said interconnection grid array of lead free solder joints comprise a material selected from the group consisting of Sn—Ag, Sn—Ag—Sb, Sn—Ag—Bi, Sn—Ag—Cu, Sn—Ag—Cu—Sb, Sn—Ag—Cu—Bi, Sn—Ag—Bi, Sn—Ag—Bi—Sb, Sn—Cu, Sn—Cu—Sb, Sn—Cu—Bi or combinations thereof.
10. The method of claim 8 wherein said interconnection grid array of lead free solder joints comprise a material selected from the group consisting of Sn—Zn, Sn—Zi—Bi, Sn—In, Sn—Bi, Sn—Ag—In, Sn—Ag—In—Cu or combinations thereof.
11. The method of claim 8 wherein said array of lead-containing solder is selected from the group consisting of an array of lead-containing solder paste, an array of lead-containing solder paste with organic flux, or an array of lead-containing solder paste without organic flux.
12. The method of claim 11 wherein said array of lead-containing solder comprises a tin-lead paste.
13. The method of claim 8 wherein said homogenous hybrid interconnect grid array is formed at temperature ranges from about 175° C. to about 260° C. for said sufficient time ranging from about 1 minute to about 4 minutes.
14. The method of claim 8 wherein said configurations of said solder joints are substantially oblate ellipsoid shapes.