Substrates for performing analytical reactions
Substrates, including zero mode waveguide substrates that have been fabricated to provide additional functional elements and/or components including increased volumes for positioning of active surfaces and/or components for the mitigation of negative electrochemical properties of the underlying substrates.
1. A zero mode waveguide substrate, comprising:
a transparent substrate layer having at least a first surface;
a metal cladding layer disposed upon the first surface of the transparent substrate layer;
an aperture disposed through the cladding layer to the transparent substrate layer, and forming a core region surrounded by the metal cladding layer, wherein the core is dimensioned to prevent electromagnetic radiation of a frequency greater than a cut-off frequency from propagating entirely through the core; and
a sacrificial anode disposed upon the cladding layer.
2. The zero mode waveguide substrate of claim 1 , wherein the sacrificial anode is attached to the metal cladding layer.
3. The zero mode waveguide substrate of claim 1 , wherein the sacrificial anode comprises a metal layer disposed on an upper surface of the cladding layer.
4. The zero mode waveguide of claim 1 , wherein the sacrificial anode comprises a metal selected from Zn, Mg, Al and Fe.
5. The zero mode waveguide substrate of claim 1 , wherein the sacrificial anode comprises a zinc layer disposed on an upper surface of the cladding layer.
6. The zero mode waveguide of claim 1 , wherein the sacrificial anode comprises a metal particle, wire or strip.
7. The zero mode waveguide of claim 6 , wherein the sacrificial anode is deposited upon but not attached to the cladding layer.
8. A zero mode waveguide substrate, comprising:
a transparent substrate layer
an opaque cladding layer; and
a core, comprising an aperture disposed though the cladding layer and extending at least partially into the transparent substrate layer.
9. The zero mode waveguide of claim 8 , wherein the transparent substrate layer comprises at least first and second transparent layers, the second transparent layer being disposed upon the first transparent layer, and the cladding layer being disposed upon the second transparent layer, wherein the aperture extends though the cladding layer and the second transparent layer.
10. The zero mode waveguide substrate of claim 9 , wherein the cladding layer comprises a metal.
11. The zero mode waveguide of claim 8 , further comprising a reactive surface disposed within the core and at least partially within a portion of the core extending into the transparent substrate layer.
12. The zero mode waveguide of claim 11 , wherein the reactive surface comprises a polymerase enzyme.
13. A method of monitoring a reaction, comprising:
providing a reaction mixture within a core of a zero mode waveguide that comprises a metal cladding layer, wherein the zero mode waveguide includes a sacrificial anode; and
monitoring the reaction mixture within an illumination volume of the core.
14. The zero mode waveguide substrate of claim 9 , wherein the second transparent layer comprises the same material as the first transparent layer.
15. The zero mode waveguide substrate of claim 9 , wherein the second transparent layer comprises a different material from the first transparent layer.
16. The zero mode waveguide substrate of claim 9 , wherein the first transparent layer and the second transparent layer each comprise a member independently selected from: glass, quartz, fused silica, alumina and a transparent polymer.
17. The zero mode waveguide substrate of claim 9 , wherein the aperture extends at least partially into the first transparent layer.
18. The zero mode waveguide substrate of claim 9 , further comprising a reactive surface disposed within the core and at least partially within a portion of the core extending through the second transparent layer.
19. The zero mode waveguide substrate of claim 18 , wherein the reactive surface comprises a polymerase enzyme.
20. The zero mode waveguide substrate of claim 18 , wherein the reactive substrate is coupled to the core by linker molecules.
21. The zero mode waveguide substrate of claim 11 , wherein the reactive substrate is coupled to the core by linker molecules.
22. The zero mode waveguide substrate of claim 8 , wherein the transparent substrate layer comprises a member selected from: glass, quartz, fused silica, alumina and a transparent polymer.
23. The zero mode waveguide substrate of claim 8 , wherein the opaque cladding layer comprises a metal that is a member selected from aluminum, gold, platinum and chromium.
24. The zero mode waveguide substrate of claim 8 , wherein the opaque cladding layer comprises at least a first and a second metal layer.
25. The zero mode waveguide substrate of claim 24 , wherein the at least first and second metal layers are each a member independently selected from: aluminum, gold, platinum and chromium.
26. The zero mode waveguide substrate of claim 8 , wherein the opaque cladding layer has a thickness from about 25 nm to about 500 nm.
27. The zero mode waveguide substrate of claim 8 , wherein the core is dimensioned to prevent electromagnetic radiation of a frequency greater than a cut-off frequency from propagating entirely through the core.
28. The zero mode waveguide of claim 8 , further comprising a protective surface disposed within the core and at least partially within a portion of the core extending into the transparent substrate layer.
29. The zero mode waveguide of claim 28 , wherein the protective surface prevents nonspecific surface associations.
30. The zero mode waveguide of claim 8 , wherein the portion of the core extending at least partially into the transparent substrate layer has a diameter equivalent to the diameter of the portion of the core disposed through the cladding layer.