Method for designing gratings
View Patent ↗A method for designing a grating comprises steps of (a1) generating a first diffraction spectrum based on calculation values of a plurality of structural parameters, (a2) calculating a first difference value between the first diffraction spectrum and a first nominal spectrum, (a3) setting a default difference value with the first difference value and default structural parameter values with the structural parameter values, (b1) changing one of the structural parameter values to generate a second diffraction spectrum, (b2) calculating a second difference value between the second diffraction spectrum and a second nominal spectrum, and (c) comparing the default difference value and the second difference value, updating a default difference value with the smaller one, and updating the default structural parameter values with the structural parameter values corresponding to the smaller one.
1. A method for designing gratings, comprising steps of:
(a1) generating a first diffraction spectrum based on calculation values of a plurality of structural parameter;
(a2) calculating a first difference value between the first diffraction spectrum and a first nominal spectrum;
(a3) setting a default difference value with the first difference value and default structural parameter values with the structural parameter values;
(b1) changing one of the structural parameter values to generate a second diffraction spectrum;
(b2) calculating a second difference value between the second diffraction spectrum and a second nominal spectrum; and
(c) comparing the first difference value and the second difference value, updating the default difference value with the smaller one, and updating the default structural parameter values with the structural parameter values corresponding to the smaller one.
2. The method for designing gratings according to claim 1 , further comprising a step of (d) repeating the steps (b1), (b2) and (c) for predetermined times after the step (c), and designing the gratings based on the default structural parameter values.
3. The method for designing gratings according to claim 1 , wherein the first diffraction spectrum and the second diffraction spectrum are generated based on a rigorous coupled wave theory.
4. The method for designing gratings according to claim 1 , wherein the first difference value is a root mean square error value between the intensity of the first diffraction spectrum and the intensity of the first nominal spectrum.
5. The method for designing gratings according to claim 1 , wherein the second difference value is a root mean square error value between the intensity of the second diffraction spectrum and the intensity of the second nominal spectrum.
6. The method for designing gratings according to claim 1 , wherein the structural parameter values include a refractive index, a refractive index of polysilicon, a pitch of the grating, a line width of the grating, or an overlay error.
7. The method for designing gratings according to claim 1 , wherein the diffraction spectrums are polarization diffraction spectrums.
8. The method for designing gratings according to claim 7 , wherein the diffraction spectrums are s-polarization diffraction spectrums or p-polarization diffraction spectrums.
9. The method for designing gratings according to claim 1 , being applied to an angular scatterometer, a reflectometer, or an ellipsometer.