IP Library Granted Patent US 8,001,830
Granted Patent B2
US 8,001,830 · App. 11/803,421 · Granted Aug 23, 2011

High frequency deflection measurement of IR absorption

Assignee: Anasys Instruments, Inc.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,001,830
App. No.
11/803,421
Granted
Aug 23, 2011
Kind
B2
Abstract

An AFM based technique has been demonstrated for performing highly localized IR spectroscopy on a sample surface. Such a technique implemented in a commercially viable analytical instrument would be extremely useful. Various aspects of the experimental set-up have to be changed to create a commercial version. The invention addresses many of these issues thereby producing a version of the analytical technique that cab be made generally available to the scientific community.

Claims (14)

1. Method of measuring a localized IR spectra of a sample comprising:

illuminating sample with pulsed variable wavelength IR radiation with an optical parametric oscillator as an IR source;

placing an AFM probe on the sample;

collecting deflection data from the probe due to exciting a resonant oscillation of the probe in response to thermal expansion of the sample due to absorption of radiation from the IR source; and,

repeating the collecting step while varying IR radiation wavelength to create an IR absorption spectrum from the deflection data.

2. Method of claim 1 further comprising scanning the probe to various points on the sample surface and repeating the data collection and spectra creation steps.

3. Method of claim 1 wherein a pulse frequency of the IR source is chosen to be at or near a contact resonant frequency of the AFM probe.

4. Method of claim 1 further comprising the step of measuring a relative thermal expansion coefficient of the region of sample by varying the probe's temperature; and, observing at least one of the deflection due to thermal expansion or the temperature due to thermal diffusivity.

5. System for measuring a localized IR spectrum on a sample surface comprising:

a pulsed, variable wavelength optical parametric oscillator as an IR source disposed to illuminate the sample; and,

an AFM, including a scanner, provision for mounting of the sample, a cantilever probe with a probe tip, and a cantilever deflection measurement capability.

6. System according to claim 5 wherein at least a part of the cantilever probe is transparent to IR energy from the IR source.

7. System according to claim 5 wherein at least a part of the cantilever probe is reflective to IR energy from the IR source.

8. System according to claim 5 wherein at least at a part of the cantilever probe is at least one of coated with or constructed of metal.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 21, 2018
From: ANASYS INSTRUMENTS CORP.
To: BRUKER NANO, INC.
Reel/Frame 046942/0185 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 7, 2010
From: READING, MICHAEL; KJOLLER, KEVIN
To: ANASYS INSTRUMENTS CORP.
Reel/Frame 024196/0360 →
Continuity (1)
Related Publication 20080283755A1 · Nov 20, 2008