High power excimer laser with a pulse stretcher
View Patent ↗An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.
1. An apparatus comprising:
a high power excimer or molecular fluorine gas discharge laser DUV light source system comprising:
a pulse stretcher comprising:
an optical delay line mirror,
an optical delay line mirror gas purging assembly comprising:
a purging gas supply system directing purging gas across a face of the optical delay line mirror;
the purging gas supply system comprising:
a purging gas supply line;
a purging gas distribution manifold and a baffle arrangement directing purging gas across the face of the respective optical delay path mirror;
and wherein the baffle comprises a light transmitting opening exposing a respective optical delay path mirror to a light beam in the delay path.
2. The apparatus of claim 1 further comprising:
the optical delay line mirror comprising a plurality of optical delay line mirrors;
the purging gas supply system directing purging gas across a face of each of the plurality of optical delay line mirrors.
3. The apparatus of claim 1 further comprising:
the distribution manifold comprising:
a top plate and a bottom plate forming internal channels when joined together connecting a purging gas inlet plenum to gas manifold gas distribution openings.
4. The apparatus of claim 1 further comprising:
a mirror position adjustment mechanism adjusting the position of an optical delay path mirror to correct for errors in the alignment of the optical delay path.
5. The apparatus of claim 2 further comprising:
a mirror position adjustment mechanism adjusting the position of an optical delay path mirror to correct for errors in the alignment of the optical delay path.
6. The apparatus of claim 3 further comprising:
a mirror position adjustment mechanism adjusting the position of an optical delay path mirror to correct for errors in the alignment of the optical delay path.
7. The apparatus of claim 4 further comprising:
the mirror position adjustment mechanism comprising:
an optical delay path mirror mount moveably connected to an optical delay path housing wall for movement of the optical delay path mirror relative to the optical delay path.
8. The apparatus of claim 5 further comprising:
the mirror position adjustment mechanism comprising:
an optical delay path mirror mount moveably connected to an optical delay path housing wall for movement of the optical delay path mirror relative to the optical delay path.
9. The apparatus of claim 6 further comprising:
the mirror position adjustment mechanism comprising:
an optical delay path mirror mount moveably connected to an optical delay path housing wall for movement of the optical delay path mirror relative to the optical delay path.