Focused ION beam apparatus
View Patent ↗It is an object of the present invention to provide a focused ion beam apparatus capable of prolonging a service life of an aperture, preventing contaminants from increasing when a column valve is closed, and being quickly restarted. A high-voltage power supply controller lowers an extraction voltage applied to an extraction electrode or lowers a control voltage applied to a control electrode to set an emission to 0 μA when a column valve is closed. The high-voltage power supply controller returns the extraction voltage applied to the extraction electrode to an original extraction voltage or returns the control voltage applied to the control electrode to an original control voltage when a column valve is opened.
1. A focused ion beam apparatus comprising:
an ion source;
an extraction electrode for extracting an ion beam emission from the ion source;
a lens for focusing the ion beam extracted from the ion source by the extraction electrode;
a condenser electrode which forms the lens;
an aperture for restricting a beam current of the ion beam;
a column valve for holding a degree of vacuum; and
control means for controlling an extraction voltage applied to the extraction electrode according to an operation for opening or closing the column valve.
2. The focused ion beam apparatus according to claim 1 ,
wherein the control means lowers the extraction voltage applied to the extraction electrode when the column valve is closed, and returns the extraction voltage applied to the extraction electrode to an original voltage when the column valve is opened.
3. The focused ion beam apparatus according to claim 2 , further comprising a bias power supply for generating a bias voltage,
wherein the control means connects the bias power supply to the extraction electrode when the column valve is closed, and disconnects the bias power supply from the extraction electrode when the column valve is opened.
4. A focused ion beam apparatus comprising:
an ion source;
an extraction electrode for extracting an ion beam emission from the ion source;
a lens for focusing the ion beam extracted from the ion source by the extraction electrode;
a condenser electrode which forms the lens;
an aperture for restricting a beam current of the ion beam;
a column valve for holding a degree of vacuum; and
control means for controlling a voltage applied to the condenser electrode according to an operation for opening or closing the column valve.
5. The focused ion beam apparatus according to claim 4 ,
wherein the control means lowers the voltage applied to the condenser electrode when the column valve is closed, and returns the voltage applied to the condenser electrode to an original voltage when the column valve is opened.
6. The focused ion beam apparatus according to claim 5 , further comprising a bias power supply for generating a bias voltage,
wherein the control means connects the bias power supply to the condenser electrode when the column valve is closed, and disconnects the bias power supply from the condenser electrode when the column valve is opened.
7. A focused ion beam apparatus comprising:
an ion source;
a control electrode for controlling an ion beam emission extracted from the ion source to be constant;
a lens for focusing the ion beam extracted from the ion source by the extraction electrode and the control electrode;
a condenser electrode which forms the lens;
an aperture for restricting a beam current of the ion beam;
a column valve for holding a degree of vacuum; and
control means for controlling a control voltage applied to the control electrode according to an operation for opening or closing the column valve.
8. The focused ion beam apparatus according to claim 7 ,
wherein the control means lowers the control voltage applied to the control electrode when the column valve is closed, and returns the control voltage applied to the control electrode to an original voltage when the column valve is opened.
9. The focused ion beam apparatus according to claim 8 , further comprising a bias power supply for generating a bias voltage,
wherein the control means connects the bias power supply to the control electrode when the column valve is closed, and disconnects the bias power supply from the control electrode when the column valve is opened.
10. A focused ion beam apparatus comprising:
an ion source;
a control electrode for controlling an ion beam emission extracted from the ion source to be constant;
a lens for focusing the ion beam extracted from the ion source by the extraction electrode and the control electrode;
a condenser electrode which forms the lens;
an aperture for restricting a beam current of the ion beam;
a column valve for holding a degree of vacuum; and
control means for controlling a voltage applied to the condenser electrode according to an operation for opening or closing the column valve.
11. The focused ion beam apparatus according to claim 10 ,
wherein the control means lowers the voltage applied to the condenser electrode when the column valve is closed, and returns the voltage applied to the condenser electrode to an original voltage when the column valve is opened.
12. The focused ion beam apparatus according to claim 11 , further comprising a bias power supply for generating a bias voltage,
wherein the control means connects the bias power supply to the condenser electrode when the column valve is closed, and disconnects the bias power supply from the condenser electrode when the column valve is opened.