Surface inspection method and surface inspection apparatus
View Patent ↗When detecting light scattered by an object to be inspected by using a pulse laser as a light source, noise increases unless a sampling repletion period of an A/D converter is determined so as to be related to a pulse oscillation repetition period of the light source. (1) The sampling repletion period of the A/D converter is set equal to the pulse oscillation repetition period of the light source or an integer times thereof, and the sampling is synchronized with oscillation of the light source. Or (2) the sampling repletion period of the A/D converter is set equal to a half-integer times the pulse oscillation repetition period of the light source. Even if a ripple component resulting from emission pulses of the light source remains in the scattered light signal supplied to the A/D converter remains, therefore, its influence can be eliminated or reduced.
1. A surface inspection method for detecting contaminated particles or defects existing on a surface of an object to be inspected or inside near the surface, by using an object to be inspected moving stage for moving the object to be inspected, a pulse laser light source for conducting pulse oscillation repetitively in time, illumination means for irradiating an illumination spot having a predetermined size on the surface of the object to be inspected with pulse light supplied from the light source, scattered/diffracted/reflected light detection means for detecting light generated by scattering/diffracting/reflecting the irradiating light in the illumination spot and converting the light to an electric signal, A/D conversion means for converting the electric signal to digital data, and particle size calculation means for calculating a size of a contaminated particle or defect on the basis of the digital data, wherein
the A/D conversion means samples the electric signal at substantially constant sampling intervals, and
the sampling interval is determined so as to be associated with a pulse oscillation repetition period of the laser light source.
2. The surface inspection method according to claim 1 , wherein
the sampling interval of the A/D conversion means is equal to the pulse oscillation repetition period of the pulse laser light source or an integer times thereof, and
sampling in the A/D conversion means is synchronized with the pulse oscillation of the pulse laser light source.
3. The surface inspection method according to claim 1 , wherein the A/D conversion means is configured to have a sampling interval that is equal to approximately a half-integer times inclusive of approximately ½ times (½ of an odd number times such as 3/2, 5/2, 7/2, . . . times) as long as the pulse oscillation repetition period of the pulse laser light source.
4. The surface inspection method according to claim 3 , wherein the particle size calculation means is configured to calculate a size of a contaminated particle or defect on the basis of the digital data sampled at two or more points that are adjacent in time by the A/D conversion means.
5. The surface inspection method according to claim 4 , wherein the processing on the at least two digital data is conducted so as to minimize influence of a ripple component which is contained in the electric signal obtained from the scattered/diffracted/reflected light detection means and which results from an emission pulse train supplied from the pulse laser light source.
6. A surface inspection apparatus for detecting contaminated particles or defects existing on a surface of an object to be inspected or inside near the surface, the surface inspection apparatus comprising:
an object to be inspected moving stage for moving the object to be inspected;
a pulse laser light source for conducting pulse oscillation repetitively in time;
illumination optics for irradiating an illumination spot having a predetermined size on the surface of the object to be inspected with pulse light supplied from the light source;
a scattered/diffracted/reflected light detection system for detecting light generated by scattering/diffracting/reflecting the irradiating light in the illumination spot and converting the light to an electric signal;
an A/D conversion system for converting the electric signal to digital data; and
a particle size calculation system for calculating a size of a contaminated particle or defect on the basis of the digital data,
wherein
a maximum response frequency of the scattered/diffracted/reflected light detection system is set to be lower than a repetition rate of the pulse laser light source, and
the A/D conversion system is configured to have a sampling interval that is equal to approximately a half-integer times inclusive of approximately ½ times as long as a pulse oscillation repetition period of the pulse laser light source.
7. The surface inspection apparatus according to claim 6 , wherein the particle size calculation means is configured to calculate a size of a contaminated particle or defect on the basis of the digital data sampled at two or more points that are adjacent in time by the A/D conversion means.
8. The surface inspection apparatus according to claim 7 , wherein the processing on the digital data sampled at two or more points is conducted so as to minimize influence of a ripple component which is contained in the electric signal obtained from the scattered/diffracted/reflected light detection means and which results from an emission pulse train supplied from the pulse laser light source.
9. The surface inspection apparatus according to claim 8 , wherein the processing on the digital data is addition or averaging of the digital data sampled at two or more points.
10. The surface inspection apparatus according to claim 8 , wherein the processing on the digital data is weighted sum or weighted averaging of the digital data sampled at two or more points.
11. The surface inspection apparatus according to claim 7 , wherein the object to be inspected moving stage conducts rotation movement in primary scan and translation movement in secondary scan.
12. The surface inspection apparatus according to claim 11 , wherein relations among a primary scan linear velocity of the object to be inspected moving stage, a size of the illumination spot in a direction of the main scan of the object to be inspected moving stage, and a repetition rate of the pulse laser light source are set so as to generate pulse emission from the pulse laser light source at least approximately five times within a time period over which one point on the object to be inspected passes through the illumination spot in the primary scan of the object to be inspected moving stage.
13. The surface inspection apparatus according to claim 12 , wherein
the pulse laser light source comprises a solid-state laser having a wavelength of 355 nm and a repetition rate in a range of 50 to 180 MHz, and
a sampling interval of the A/D conversion system is set equal to approximately 1.5 times as long as a pulse oscillation repetition period of the pulse laser light source.
14. A surface inspection method comprising:
moving the object to be inspected;
irradiating a surface of the object to be inspected with pulse light supplied from a light source which conducts pulse oscillation repetitively in time;
detecting light generated by at least any of scattering, diffracting and reflecting the irradiating light on the surface of the object to be inspected and converting the light to an electric signal;
converting the electric signal to digital data;
calculating a size of a contaminated particle or defect on the basis of the digital data; and
detecting a contaminated particle or defect existing on the surface of the object to be inspected or inside near the surface,
wherein
when converting the electric signal to digital data, the electric signal is sampled at substantially constant sampling intervals, and
the sampling interval is determined so as to be associated with a pulse oscillation repetition period of the light source.
15. The surface inspection method according to claim 14 , wherein
the sampling interval is equal to the pulse oscillation repetition period of the light source or an integer time the oscillation repetition period of the light source, and
the sampling is synchronized with the pulse oscillation of the light source.
16. The surface inspection method according to claim 14 , wherein the sampling interval is equal to approximately a half-integer times, inclusive of approximately ½ times, the pulse oscillation repetition period of the light source.
17. The surface inspection method according to claim 16 , wherein a size of a contaminated particle or defect is calculated on the basis of the digital data sampled at two or more points adjacent in time.
18. The surface inspection apparatus according to claim 17 , wherein the processing on the digital data sampled at two or more points is conducted so as to minimize influence of a ripple component which is contained in the electric signal and which results from an emission pulse train supplied from the light source.
19. A surface inspection apparatus comprising:
an object to be inspected moving stage for moving an object to be inspected;
a light source for conducting pulse oscillation repetitively in time;
illumination optics for irradiating an illumination spot having a predetermined size on a surface of the object to be inspected with pulse light supplied from the light source;
a photodetector system for detecting light generated by scattering/diffracting/reflecting the irradiating light in the illumination spot and converting the light to an electric signal;
an A/D conversion system for converting the electric signal to digital data;
a particle size calculation system for calculating a size of a contaminated particle or defect on the basis of the digital data; and
a sampling controller for controlling a sampling interval of the A/D conversion system on the basis of a pulse oscillation repetition period of the light source.
20. The surface inspection apparatus according to claim 19 , wherein
the light source comprises a solid-state laser having a repetition rate in a range of 50 to 180 MHz, and
a sampling interval of the A/D conversion system is set equal to approximately a half-integer times as long as a pulse oscillation repetition period of the light source.