In-plane optical metrology
View Patent ↗A structure that is located adjacent to a measurement target on a substrate is used to convert incident radiation from an optical metrology device to be in-plane with the measurement target. The structure may be, e.g., a grating or photonic crystal, and may include a waveguide between the structure and the measurement target. The in-plane light interacts with the measurement target and is reflected back to the structure, which converts the in-plane light to out-of-plane light that is received by the optical metrology device. The optical metrology device then uses the information from the received light to determine one or more desired parameters of the measurement target. Additional structures may be used to receive light that is transmitted through or scattered by the measurement target if desired.
1. A method comprising:
generating a beam of radiation;
focusing the beam of radiation to form an incident beam of radiation on an optical coupler formed at a location that is laterally adjacent to a structure to be measured, the structure and the optical coupler formed on a substrate;
converting the incident beam of radiation with the optical coupler to be parallel with the substrate and incident on and interacting with the structure to produce return radiation;
converting the return radiation to be non-parallel with the substrate;
detecting the return radiation;
determining a measurement parameter of the structure using the detected return radiation; and
reporting the determined measurement parameter, wherein reporting the determined measurement parameter comprises displaying the determined measurement parameter or storing the measurement parameter.
2. The method of claim 1 , wherein the return radiation is converted to be non-parallel with the substrate at the same location that the incident beam of radiation is converted to be parallel with the substrate.
3. The method of claim 1 , wherein the return radiation is converted to be non-parallel with the substrate at a different location than the location where the incident beam of radiation is converted to be parallel with the substrate.
4. The method of claim 1 , wherein converting the incident beam of radiation and converting the return radiation is performed using a photonic crystal or a grating.
5. The method of claim 1 , the method further comprising guiding radiation to the structure after converting the incident beam of radiation to be parallel with the substrate.
6. The method of claim 1 , further comprising guiding the return radiation to a location where the return radiation is converted to be non-parallel with the substrate.
7. The method of claim 1 , wherein the incident beam of radiation is normally incident on the substrate.
8. The method of claim 1 , wherein the return radiation is converted to be normal to the substrate.