Substrate exposure apparatus and illumination apparatus
View Patent ↗An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.
1. A substrate exposure apparatus comprising:
an exposure light source;
a beam forming device that forms light emitted from the exposure light source into highly directional light beams;
a first optical system that guides the directional beams to an integrator;
the integrator consisting of J and K rod lenses arrayed in a x-direction and in a v-direction, respectively, whereas each of the rod lenses measures dx in the x-direction and dy in the y-direction, and the length and refractive index of each rod lens are represented by L and n, respectively, and the angles of divergence in the x-direction and in the y-direction of the beam emerging from the rod lens are represented by θx and θy, respectively;
a second optical system that irradiates the widths Wx and Wy of a two-dimensional optical space modulator with light emerging from the integrator, whereas the focal distances in the x- and y-directions of the second optical system are fx and fy;
the two-dimensional optical space modulator whose dimensions in the x- and y-direction are Hx and Hy, respectively;
a projection optical system, having a micro-lens unit including a micro-lens array and a pinhole array, that projects the light reflected or transmitted by the two-dimensional optical space modulator onto an exposure substrate that is exposed to light; and
a stage that is mounted with and scans the exposure substrate in at least one direction, wherein setting Wx=Hx, Wy=Hy, the parameters Wx, Wy, dx, dy, J, K, fx, fy obey the following equations:
J·dx /( K·dy )= fx/fY
Wx=fx·θx=fx·ndx/ 2 L
Wy=fy·θy=fy·ndy/ 2 L.