Apparatus and method for controlled particle beam manufacturing
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
1. A workpiece processing apparatus comprising:
an exposure chamber comprising:
a charged particle source configured to generate a stream of charged particles;
a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis of propagation;
a beam digitizer downstream of the collimator, the beam digitizer configured to create temporally and spatially resolved digital flashes comprising groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis of propagation;
a deflector downstream of the beam digitizer, the deflector configured to deflect said digital flashes transversely and longitudinally to the direction of propagation;
an objective lens assembly downstream of the deflector, the objective lens assembly configured to demagnify said digital flashes or one or more groups of said digital flashes; and
a workpiece stage downstream of the deflector, the workpiece stage configured to hold a workpiece; and
a pattern data transfer system configured to receive a pattern to be written on the workpiece and to produce a format usable by the exposure chamber to generate and deflect the digital flashes into the pattern.
2. The apparatus of claim 1 , wherein the pattern data transfer system is configured to convert the pattern to be written from a first format to a second format.
3. The apparatus of claim 2 , wherein the first format is computer aided design (CAD).
4. The apparatus of claim 2 , wherein the first format is graphic data system (GDSII).
5. The apparatus of claim 2 , wherein the first format is OASIS.
6. The apparatus of claim 2 , wherein the second format is exposure ready format (ERF).
7. The apparatus of claim 1 , wherein the pattern data transfer system is configured to modify a dosage of the digital flashes based on the pattern to be written.
8. The apparatus of claim 1 , wherein the pattern data transfer system is configured to reduce overlapping routines.
9. The apparatus of claim 1 , wherein pattern data transfer system comprises an exposure data preparation (EDP) package comprising a user interface.
10. The apparatus of claim 1 , wherein the pattern data transfer system is configured to merge similar features of the pattern to be written.
11. The apparatus of claim 1 , wherein the pattern data transfer system is configured to define minor and major deflection fields using a field partition routine and to normalize densities in a plurality of data frames.
12. The apparatus of claim 1 , wherein the pattern data transfer system is configured to create a write strategy and wherein the beam digitizer is configured to adjust at least one parameter of the digital flashes based on the write strategy.
13. The apparatus of claim 12 , wherein the parameter comprises frequency.
14. The apparatus of claim 12 , wherein the parameter comprises amplitude.
15. The apparatus of claim 12 , wherein the parameter comprises duty cycle.
16. The apparatus of claim 12 , wherein the parameter comprises particle density.
17. The apparatus of claim 1 , wherein the pattern data transfer system is configured to fracture the pattern to be written into written subfields and non-written subfields and to send the written subfields to a data path module configured to rasterize the written subfields into a bitmap.
18. The apparatus of claim 17 , wherein the exposure chamber is configured to move the workpiece stage and deflect the digital flashes from a first written subfield to a non-adjacent written subfield without exposing the non-written subfields.
19. The apparatus of claim 1 , further comprising software including at least one software package from a group consisting of pattern preparation software, pattern writing software, automated processing software, pattern calibration software, pattern registration software, automated alignment software, automated process development software, and automated metrology software.
20. The apparatus of claim 1 , wherein the pattern to be written comprises a plurality of layers of a device.