Surface-potential distribution measuring apparatus, image carrier, and image forming apparatus
A surface-potential distribution measuring apparatus includes an electron gun, an electron-beam optical system, an electron-emission panel, a detector, and a control system. The electron-beam optical system is located between the electron gun and a sample, and focuses a beam of electrons emitted from the electron gun to the surface of the sample. The electron-emission panel is located near the sample to be collided with at least part of the electrons via the sample, and emits secondary electrons corresponding to the number of collided electrons. The detector detects at least part of the secondary electrons. The control system obtains potential distribution on the surface of the sample based on a detection result obtained by the detector.
1. A surface-potential distribution measuring apparatus that measures a potential distribution of a latent image on a surface of a sample by scanning the surface with a beam of charged particles, the surface-potential distribution measuring apparatus comprising:
an image forming unit that forms the latent image on the surface of the sample by distributing a charge potential on the surface of the sample;
a beam generating unit that generates a beam of charged particles;
an optical system that is located between the beam generating unit and the sample, and focuses the beam from the beam generating unit to the surface of the sample;
a particle emitting member that is located near the sample to be collided with at least part of the charged particles via the sample, and emits secondary charged particles corresponding to number of collided charged particles;
a detecting unit that detects at least part of the secondary charged particles; and
a calculating unit that calculates the potential distribution of a latent image pattern formed on the surface of the sample by the image forming unit based on a detection result obtained by the detecting unit.
2. The surface-potential distribution measuring apparatus according to claim 1 , wherein the particle emitting member faces the detecting unit.
3. The surface-potential distribution measuring apparatus according to claim 1 , wherein the particle emitting member is located between the optical system and the sample, and includes an opening which the beam can pass through.
4. The surface-potential distribution measuring apparatus according to claim 3 , wherein a diameter of the opening is equal to or smaller than 2 millimeters.
5. The surface-potential distribution measuring apparatus according to claim 1 , wherein the particle emitting member has a smooth surface against which at least part of the charged particles collides.
6. The surface-potential distribution measuring apparatus according to claim 1 , wherein the particle emitting member includes a first surface against which at least part of the charged particles collides, and a second surface on which a conductive film is formed, the second surface being opposite to the first surface.
7. The surface-potential distribution measuring apparatus according to claim 1 , further comprising:
a voltage applying unit that applies a voltage to the particle emitting member, and optimizes a ratio at which the particle emitting member emits the secondary charged particles.
8. The surface-potential distribution measuring apparatus according to claim 1 , wherein the charged particles that collides with the particle emitting member via the sample have been repulsed near the surface of the sample before reaching the surface of the sample.
9. The surface-potential distribution measuring apparatus according to claim 1 , further comprising:
a latent-image forming unit that forms a latent image on the surface of the sample.
10. A surface-potential distribution measuring apparatus that measures potential distribution on a surface of a sample by scanning the surface with a beam of charged particles, the surface-potential distribution measuring apparatus comprising:
an image forming unit that forms a latent image on the surface of the sample by distributing a charge potential on the surface of the sample;
a beam generating unit that generates a beam of charged particles;
an optical system that is located between the beam generating unit and the sample, and focuses the beam from the beam generating unit to the surface of the sample;
a reversed-particle detecting unit that is located near the sample and detects a repulsive particle which is in the beam of charged particles proceeding to the sample and is repulsed without reaching the sample; and
a calculating unit that calculates potential distribution of a latent image pattern formed on the surface of the sample by the image forming unit based on a detection result obtained by the reversed-particle detecting unit.
11. The surface-potential distribution measuring apparatus according to claim 10 , wherein the detecting unit is in a meshed configuration.
12. The surface-potential distribution measuring apparatus according to claim 11 , wherein the detecting unit is made of nonmagnetic conductive material.
13. The surface-potential distribution measuring apparatus according to claim 10 , wherein the detecting unit is located at least 0.1 millimeter above the surface of the sample.
14. The surface-potential distribution measuring apparatus according to claim 10 , further comprising:
a voltage control unit that changes an acceleration voltage of the beam.
15. The surface-potential distribution measuring apparatus according to claim 10 , further comprising:
a bias control unit that changes surface potential bias.