Gas ionization source
A gas ionizer includes a photocatalyst activated with an electric field to emit electrons. The photocatalyst is also illuminated with an ultraviolet light source. The ionized gas is passed through a chamber between the photocatalyst and the ultraviolet light source. The photocatalyst may be titanium oxide.
1. A gas ionizer comprising:
a conducting substrate with a photocatalyst layer deposited thereon;
an ultraviolet(UV) light source with a transparent conducting layer positioned on a face of the UV light source facing the conducting substrate with a gap formed between the UV light source and the conducting substrate; and
electronics configured for applying an electric field to the photocatalyst layer such that the conducting substrate possesses a negative bias relative to the transparent conducting layer.
2. The gas ionizer as recited in claim 1 , wherein the photocatalyst layer comprises titanium oxide.
3. The gas ionizer as recited in claim 2 , wherein the electronics configured for applying the electric field to the photocatalyst layer is coupled to the conducting substrate and the transparent conducting layer.
4. The gas ionizer as recited in claim 2 , further comprising:
another substrate with another photocatalyst layer deposited thereon, the photocatalyst layer comprising titanium oxide.
5. The gas ionizer as recited in claim 1 , wherein the electronics are configured for applying the electric field to the photocatalyst layer to cause an emission of electrons from the photocatalyst layer into the gap to ionize a gas passing within the gap.
6. A method of manufacture comprising:
depositing a photocatalyst layer on a conducting substrate;
positioning a UV light source with a transparent conducting layer positioned on a face of the UV light source facing the conducting substrate across an air gap from the photocatalyst layer; and
adding electronics configured for applying an electric field to the photocatalyst layer such that the conducting substrate possesses a negative bias relative to the transparent conducting layer.
7. The method as recited in claim 6 , wherein the electric field operates to cause electrons to be emitted from the photocatalyst layer into the air gap.
8. The method as recited in claim 6 , wherein the photocatalyst layer comprises titanium oxide.
9. The method as recited in claim 6 , further comprising another substrate with another conductor and another photocatalyst layer deposited on the another substrate, the another conductor coupled to the electronics.
10. The method as recited in claim 7 , wherein the electric field operates to cause the electrons to be emitted from the photocatalyst layer into the air gap to ionize a gas within the air gap.
11. A method for operating a negative ion gas ionization source comprising a conducting substrate with a photocatalyst deposited thereon and an ultraviolet (UV) light source with a transparent conducting layer positioned on a face of the UV light source facing the conducting substrate with gap formed between the UV light source and the substrate; the method comprising:
applying an electric field to a photocatalyst; such that the conducting substrate is negatively biased relative to the transparent conducting layer;
activating the UV light source so that UV light illuminates the photocatalyst; and
passing a gas through the gap.
12. The method as recited in claim 11 , wherein the photocatalyst comprises titanium oxide.
13. The method as recited in claim 11 , wherein the electric field operates to cause electrons to be emitted from the photocatalyst into the gap through which the gas is passed.
14. The method as recited in claim 13 , wherein the electric field operates to cause the electrons to be emitted from the photocatalyst layer into the gap to ionize the gas within the gap.