Mesoscale hybrid calibration artifact
A mesoscale calibration artifact, also called a hybrid artifact, suitable for hybrid dimensional measurement and the method for make the artifact. The hybrid artifact has structural characteristics that make it suitable for dimensional measurement in both vision-based systems and touch-probe-based systems. The hybrid artifact employs the intersection of bulk-micromachined planes to fabricate edges that are sharp to the nanometer level and intersecting planes with crystal-lattice-defined angles.
1. A hybrid calibration artifact, comprising:
a substrate, the substrate comprising an etched surface region and an unetched surface region; and
a plurality of etched planes, etched in the substrate and crystallographically aligned with crystallographic planes of the substrate, wherein a first etched plane intersects with at least one of an unetched surface plane and a second etched plane to form an edge defined by an intersection of the crystallographic planes, and wherein at least one pair of the edges are parallel and substantially straight, wherein a length of the edge and an area of the first etched plane have dimensions suitable to be measured using light of wavelengths greater than or equal to near-ultraviolet wavelengths.
2. The hybrid calibration artifact of claim 1 , wherein the edge defined by the intersection of crystallographic planes has a radius of curvature of 100 nm or less.
3. The hybrid calibration artifact of claim 1 , wherein the edge by the intersection of crystallographic planes deviates from a straight line by less than approximately 100 nm.
4. The hybrid calibration artifact of claim 1 , wherein at least a second pair of edges are perpendicular to and intersect the first pair of edges.
5. The hybrid calibration artifact of claim 1 , wherein a normal to the first etched plane and a normal to a third etched plane point are parallel and point in a same direction.
6. The hybrid calibration artifact of claim 1 , wherein a normal to the first etched plane and a normal to a third etched plane point in different directions.
7. The hybrid calibration artifact of claim 1 , wherein the first etched plane extends from the unetched surface plane to an aperture in the second etched plane.
8. The hybrid calibration artifact of claim 1 , wherein the plurality of etched planes are arranged in a pattern.
9. The hybrid calibration artifact of claim 8 , wherein the plurality of etched planes are arranged in a pattern comprising at least one of a concentric array, a radiating array, a linear array, a rectangular array, and a trapezoidal array.
10. The hybrid calibration artifact of claim 1 , comprising at least three etched planes and a sphere in contact with and affixed to the at least three etched planes.
11. The hybrid calibration artifact of claim 1 , wherein the plurality of etched planes form an irregular polygon.
12. The hybrid calibration artifact of claim 1 , wherein the plurality of etched planes form a corner-truncated rectangular mesa.
13. The hybrid calibration artifact of claim 1 , wherein the plurality of etched planes form a substantially rectangular pit.
14. The hybrid calibration artifact of claim 1 , wherein the at least one pair of the edges that are parallel and substantially straight are separated by a distance of at least 0.1 mm.