IP Library Granted Patent US 8,147,722
Granted Patent B2
US 8,147,722 · App. 11/880,918 · Granted Apr 3, 2012

Spin-coatable liquid for formation of high purity nanotube films

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Quick Facts
Patent No.
US 8,147,722
App. No.
11/880,918
Granted
Apr 3, 2012
Kind
B2
Abstract

Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×10 18 atoms/cm 3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.

Claims (25)

1. An applicator liquid comprising:

a liquid medium containing a controlled concentration of purified nanotubes,

wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, wherein the controlled concentration is from about 1 mg/L to 100 g/L,

wherein the purified nanotubes remain separate from one another without precipitation or flocculation for a time sufficient to apply the applicator liquid to a surface,

wherein the purified nanotubes are free of functionalization that deplete π electrons so that desired electrical properties of the nanotubes are maintained,

wherein the applicator liquid is free of surfactants and polymers, and

wherein the applicator liquid comprises less than 1×10 18 atoms/cm 3 of metallic impurities.

2. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 15 atoms/cm 3 of metallic impurities.

3. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of metal impurities.

4. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of heavy metal impurities.

5. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of heavy metal impurities.

6. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of group I and group II element impurities.

7. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of group I and group II element impurities.

8. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of transition metal impurities.

9. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of transition metal impurities.

10. The applicator liquid of claim 1 , wherein the applicator liquid is free of particle impurities having a diameter of greater than about 500 nm.

11. The applicator liquid of claim 1 , wherein the applicator liquid is free of particle impurities having a diameter of greater than about 300 nm.

12. The applicator liquid of claim 1 , wherein the applicator liquid is free of particle impurities having a diameter of greater than about 45 nm.

13. The applicator liquid of claim 1 , wherein the purified nanotubes are homogeneously distributed in the liquid medium without precipitation or flocculation.

14. The applicator liquid of claim 1 , wherein the liquid medium is a non-halogen solvent.

15. The applicator liquid of claim 1 , wherein the liquid medium is a non-aqueous solvent.

16. The applicator liquid of claim 1 , wherein the liquid medium is selected for compatibility with an electronics manufacturing process.

17. The applicator liquid of claim 1 , wherein the liquid medium comprises ethyl lactate.

18. The applicator liquid of claim 1 , wherein the purified nanotubes comprise conductive nanotubes.

19. The applicator liquid of claim 1 , wherein the purified nanotubes are single-walled nanotubes.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056789/0932 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Jul 8, 2021
From: SILICON VALLEY BANK
To: NANTERO, INC.
Reel/Frame 056790/0001 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0509 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0549 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded Nov 11, 2020
From: NANTERO, INC.
To: SILICON VALLEY BANK
Reel/Frame 054383/0632 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2011
From: SEN, RAHUL; SIVARAJAN, RAMESH; RUECKES, THOMAS; SEGAL, BRENT M.
To: NANTERO INC.
Reel/Frame 027144/0948 →