Method of manufacturing a semiconductor device
View Patent ↗Salient electrodes on a semiconductor chip and leads on a film substrate are to be connected together with a high accuracy. A change in lead pitch which occurs at the time of connecting salient electrodes on a semiconductor chip and inner leads on a film substrate with each other is taken into account and a correction is made beforehand to the pitch of the inner leads. Likewise, a change in lead pitch which occurs at the time of connecting electrodes on a liquid crystal substrate and outer leads on the film substrate with each other is taken into account and a correction is made beforehand to the pitch of the outer leads.
1. A method of manufacturing a semiconductor device, comprising the steps of:
(a) providing a semiconductor chip including a plurality of Au bump electrodes formed over a main surface of the semiconductor chip and having a first pitch;
(b) providing a film substrate including an insulating film formed with a polyimide resin, a plurality of Cu leads formed over a main surface of the insulating film and having a second pitch which is larger than the first pitch, and Sn plated over a surface of each of the plurality of leads;
(c) mounting the semiconductor chip to the main surface of the film substrate so as to contact the plurality of bump electrodes of the semiconductor chip with the plurality of leads of the film substrate, respectively; and
(d) electrically connecting the plurality of bump electrodes with the plurality of leads, respectively, under a first temperature which is higher than a transition point of the film substrate, while clamping a peripheral portion of the film substrate using a jig.
2. The method according to claim 1 , wherein a melting point of Au-Sn eutectic is higher than the transition point of the film substrate.
3. The method according to claim 2 , wherein the first temperature is higher than the melting point of Au-Sn eutectic.
4. The method according to claim 1 , wherein the first temperature is about 400° C., and the transition point of the film substrate is about 230° C.
5. The method according to claim 1 , wherein after the step of (d), the pitch of the plurality of leads becomes less than the second pitch.
6. The method according to claim 1 , wherein the insulating film of the film substrate is formed in an area opposed to the main surface of the mounted semiconductor chip.
7. The method according to claim 1 , further comprising, after the step of (d), a step of injecting an underfill between the main surface of the semiconductor chip and the main surface of the film substrate.