IP Library Granted Patent US 8,203,170
Granted Patent B2
US 8,203,170 · App. 11/905,434 · Granted Jun 19, 2012

Nitride semiconductor light emitting diode

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Quick Facts
Patent No.
US 8,203,170
App. No.
11/905,434
Granted
Jun 19, 2012
Kind
B2
Abstract

Provided is a nitride semiconductor light emitting diode (LED) including a substrate; an n-type nitride semiconductor layer formed on the substrate; an active layer formed on a portion of the n-type nitride semiconductor layer; a p-type nitride semiconductor layer formed on the active layer; a p-type contact layer formed on the p-type nitride semiconductor layer and doped with more than 1×10 20 /cm 3 of p-type impurities; a transparent oxide electrode formed on the p-type contact layer; a p-electrode formed on the transparent oxide electrode; and an n-electrode formed on the n-type nitride semiconductor layer where the active layer is not formed.

Claims (14)

1. A nitride semiconductor light emitting diode (LED) comprising:

a substrate;

an n-type nitride semiconductor layer formed on the substrate;

an active layer formed on a portion of the n-type nitride semiconductor layer;

a p-type nitride semiconductor layer formed on the active layer;

a p-type contact layer formed on the p-type nitride semiconductor layer and doped with p-type impurities as well as n-type impurities,

a transparent oxide electrode formed on the p-type contact layer;

a p-electrode formed on the transparent oxide electrode; and

an n-electrode formed on the n-type nitride semiconductor layer in a portion of a region in which the active layer is not formed,

wherein the p-type contact layer has a contacting area being in direct contact with the transparent oxide electrode,

wherein a doping concentration of the n-type impurities is lower than that of the p-type impurities in the contacting area of the p-type contact layer attached to the transparent oxide electrode.

2. The nitride semiconductor LED according to claim 1 , wherein the transparent oxide electrode is formed of any one selected from the group consisting of ITO, ZnO, AZO, CulnO 2 , Zn 1-x Al x O, Zn 1-x Mg x O, SnO 2 , RuO 2 , PdO, Bi 2 Ru 2 O 7 , and Bi 2 lr 2 O 7 , which have an n-type characteristic;

3. The nitride semiconductor LED according to claim 1 , wherein the transparent oxide electrode is composed of at least one or more layers.

4. The nitride semiconductor LED according to claim 1 , wherein the transparent oxide electrode is doped with n-type or p-type conductive impurities.

Assignments (3)
MERGER Recorded Aug 7, 2012
From: SAMSUNG LED CO., LTD.
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 028744/0272 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 12, 2010
From: SAMSUNG ELECTRO-MECHANICS CO., LTD.
To: SAMSUNG LED CO., LTD.
Reel/Frame 024375/0448 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 1, 2007
From: SHIM, HYUN WOOK; KANG, JOONG SEO; JEON, DONG MIN
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 019956/0600 →