Compositions of doped, co-doped and tri-doped semiconductor materials
View Patent ↗Semiconductor materials suitable for being used in radiation detectors are disclosed. A particular example of the semiconductor materials includes tellurium, cadmium, and zinc. Tellurium is in molar excess of cadmium and zinc. The example also includes aluminum having a concentration of about 10 to about 20,000 atomic parts per billion and erbium having a concentration of at least 10,000 atomic parts per billion.
1. A co-doped semiconductor material, comprising:
at least one element from Group II of the periodic table;
at least one element from Group VI of the periodic table;
a first dopant containing at least one element from Group III or Group VII of the periodic table, the first dopant having a concentration of about 10 atomic parts per billion to about 10,000 atomic parts per billion in the co-doped semiconductor material; and
a second dopant containing at least one of erbium and dysprosium, the second dopant having a concentration of about 15,000 atomic parts per billion to about 400,000 atomic parts per billion in the co-doped semiconductor material.
2. The semiconductor material of claim 1 wherein the at least one element from Group II of the periodic table includes cadmium.
3. The semiconductor material of claim 1 wherein the at least one element from Group II of the periodic table includes cadmium and zinc.
4. The semiconductor material of claim 1 wherein the at least one element from Group VI of the periodic table includes tellurium.
5. The semiconductor material of claim 1 wherein the first dopant includes aluminum and chlorine at a combined concentration of about 10 to about 10,000 atomic parts per billion.
6. The semiconductor material of claim 5 wherein the second dopant includes erbium at a concentration of about 15,000 to about 400,000 atomic parts per billion.
7. The semiconductor material of claim 5 wherein the second dopant includes dysprosium at a concentration of about 15,000 to about 400,000 atomic parts per billion.
8. The semiconductor material of claim 1 wherein the first dopant includes aluminum and indium at a concentration of about 10 to about 10,000 atomic parts per billion.
9. The semiconductor material of claim 8 wherein the second dopant includes erbium at a concentration of about 15,000 to about 400,000 atomic parts per billion.
10. The semiconductor material of claim 8 wherein the second dopant has a dysprosium concentration of about 15,000 to about 100,000 atomic parts per billion.
11. The semiconductor material of claim 1 wherein the first dopant includes aluminum at a concentration of about 10 to about 10,000 atomic parts per billion.
12. The semiconductor material of claim 11 wherein the second dopant includes erbium at a concentration of about 15,000 to about 400,000 atomic parts per billion.
13. The semiconductor material of claim 11 wherein the second dopant includes dysprosium at a concentration of about 15,000 to about 400,000 atomic parts per billion.
14. A co-doped semiconductor material, comprising:
at least one element from Group II of the periodic table;
at least one element from Group VI of the periodic table;
a first dopant containing at least one element from Group III or Group VII of the periodic table, the first dopant having a concentration of about 10 atomic parts per billion to about 10,000 atomic parts per billion in the co-doped semiconductor material; and
a second dopant containing dysprosium or erbium having a concentration of about 15,000 atomic parts per billion to about 400,000 parts per billion in the co-doped semiconductor material.
15. The semiconductor material of claim 14 wherein:
the at least one element from Group II of the periodic table includes cadmium and zinc;
the at least one element from Group VI of the periodic table includes selenium and tellurium;
the first dopant includes aluminum; and
the second dopant includes erbium.
16. The semiconductor material of claim 14 wherein:
the at least one element from Group II of the periodic table includes cadmium and zinc;
the at least one element from Group VI of the periodic table includes tellurium;
the first dopant includes aluminum and chlorine; and
the second dopant includes erbium with a concentration of about 15,000 to about 200,000 parts per billion.
17. The semiconductor material of claim 14 wherein:
the at least one element from Group II of the periodic table includes cadmium and zinc;
the at least one element from Group VI of the periodic table includes tellurium;
the first dopant includes aluminum and chlorine; and
the second dopant includes erbium at a concentration of about 15,000 to about 100,000 parts per billion.
18. The semiconductor material of claim 14 wherein:
the at least one element from Group II of the periodic table includes cadmium and zinc;
the at least one element from Group VI of the periodic table includes tellurium;
the first dopant includes aluminum and chlorine; and
the second dopant includes erbium at a concentration of about 20,000 parts per billion.
19. The semiconductor material of claim 14 wherein the semiconductor material consists essentially of cadmium, zinc, tellurium, aluminum, and erbium.
20. The semiconductor material of claim 14 wherein the second dopant includes erbium having a concentration of about 15,000 atomic parts per billion to about 400,000 parts per billion.
21. A co-doped semiconductor material, comprising:
at least one element from Group II of the periodic table;
at least one element from Group VI of the periodic table;
a first dopant containing at least one element from Group III or Group VII of the periodic table; and
a second dopant containing at least one of erbium and dysprosium, the second dopant having a concentration of at least 10 atomic parts per billion in the co-doped semiconductor material, wherein the at least one element from Group VI of the periodic table includes tellurium and selenium.
22. A co-doped semiconductor material, comprising:
at least one element from Group II of the periodic table;
at least one element from Group VI of the periodic table;
a first dopant containing at least one element from Group III or Group VII of the periodic table; and
a second dopant containing at least one of erbium and dysprosium, the second dopant having a concentration of at least 10 atomic parts per billion in the co-doped semiconductor material, wherein the at least one element from Group VI of the periodic table includes tellurium and sulfur.