Phase-change memory cell having two insulated regions
View Patent ↗A phase-change-memory cell is provided which comprises two insulated regions formed in a first phase-change material connected by a region formed in a second phase-change material. The crystallization temperature of the second phase-change material is below the crystallization temperature of the first phase-change material. By locally changing the material properties using a second PCM material, which switches phase at a lower temperature, a localized “hot spot” is obtained.
1. A phase-change-memory cell comprising two insulated regions formed in a first phase-change material connected by a region formed in a second phase-change material whereby a crystallization temperature of the second phase-change material is below a crystallization temperature of the first phase-change material.
2. The memory cell of claim 1 whereby a cross-sectional area of the connecting region is less than a cross-sectional area of the insulated regions whereby a cross-section of each region is taken in a direction perpendicular to the direction defined by the insulated regions.
3. The memory cell of claim 2 whereby a width of the cross-sectional area of the connecting region is less a width of the cross-sectional area of the insulated regions.
4. The memory cell of claim 2 whereby a height of the cross-sectional area of the connecting region is less than a height of the cross-sectional area of the insulated regions.
5. A method for forming a phase-change-memory cell according to claim 1 comprising:
forming two insulated regions in a first phase-change material; and
forming a region in a second phase-change material connecting the two insulated regions.
6. The method of claim 5 wherein the step of forming two insulated regions comprises:
forming a layer of the first phase-change material on a substrate; and,
patterning this layer to form the two insulated regions.
7. The method of claim 6 , wherein the step of patterning comprises:
a first patterning step to form a region in the first phase-change material; and,
a second patterning step separating this region into two insulated regions.
8. The method of claim 6 , wherein the step of forming the connecting region comprises:
forming a layer of the second phase-change material over the patterned layer of the first phase-change material; and,
patterning this second layer to form a region connecting the two insulated regions.
9. The method of claim 8 , wherein the second layer is patterned using a mask.
10. The method of claim 8 , wherein the second layer is patterned such that the width of the cross-sectional area of the connecting region is less than the width of the cross-sectional area of the insulated regions.