Transistor with a germanium-based channel encased by a gate electrode and method for producing one such transistor
Source and drain electrodes are each formed by an alternation of first and second layers made from a germanium and silicon compound. The first layers have a germanium concentration comprised between 0% and 10% and the second layers have a germanium concentration comprised between 10% and 50%. At least one channel connects two second layers respectively of the source electrode and drain electrode. The method comprises etching of source and drain zones, connected by a narrow zone, in a stack of layers. Then superficial thermal oxidation of said stack is performed so a to oxidize the silicon of the germanium and silicon compound having a germanium concentration comprised between 10% and 50% and to condense the germanium Ge. The oxidized silicon of the narrow zone is removed and a gate dielectric and a gate are deposited on the condensed germanium of the narrow zone.
1. A transistor comprising:
first layers made from a germanium and silicon compound with a germanium concentration between 0% and 10%,
second layers made from a germanium and silicon compound with a germanium concentration between 10% and 50%,
a source electrode and a drain electrode, each formed by alternating the first layers and the second layers,
a channel connecting one second layer of the source electrode to one second layer of the drain electrode, wherein the channel has a greater germanium concentration than the second layer, and
a gate electrode encasing the channel.
2. The transistor according to claim 1 , wherein the first layers are made of silicon.
3. The transistor according to claim 1 , wherein the second layers have different germanium concentrations.
4. The transistor according to claim 1 , wherein the second layers have the same germanium concentration.
5. The transistor according to claim 1 , wherein the second layer connected by the channel and belonging to the source electrode is arranged at the same level of the alternation of layers of the source electrode as the corresponding second layer of the drain electrode.
6. The transistor according to claim 1 , wherein the alternations of layers forming the source and drain electrodes are formed in the same stack of layers.
7. The transistor according to claim 1 , wherein the channel is substantially cylindrical.
8. The transistor according to claim 1 , wherein the gate electrode completely encases the channel.
9. The transistor according to claim 1 , wherein the transistor comprises several channels.
10. A method for producing a transistor according to claim 1 , successively comprising:
producing an alternation of first and second layers of germanium and silicon compound on a substrate, the first layers having a germanium concentration comprised between 0% and 10% and the second layers having a germanium concentration comprised between 10% and 50%, the stack beginning and ending with a first layer,
etching, in said stack, of source and drain zones designed to form the source electrode and drain electrode, and of a narrow zone connecting the source and drain zones and corresponding to the location of the channels to be formed,
performing superficial thermal oxidation of said stack so as to oxidize the silicon of the germanium and silicon compound in the narrow zone, the compound having a germanium concentration comprised between 10% and 50% and so as to condense the germanium, thus forming the channels,
removing the oxidized silicon from the narrow zone,
depositing a gate dielectric on the condensed germanium of the narrow zone,
depositing a gate metal on said gate dielectric.
11. The method according to claim 10 , wherein the thickness of the second layers is between 5 and 30 nanometers.
12. The method according to claim 10 , wherein the narrow zone has lateral dimensions between 3 and 50 nanometers and longitudinal dimensions between 5 nanometers and 1 micrometer.
13. The method according to claim 10 , wherein removal of the oxidized silicon from the narrow zone is accompanied by a selective etching step of the residual silicon of the narrow zone.
14. The method according to claim 10 , wherein the first and/or second layers are doped.
15. The method according to claim 14 , comprising selective doping of the two zones designed to form the source and drain electrodes, before the gate dielectric is deposited on the germanium.
16. The method according to claim 10 , wherein, before deposition of the gate dielectric, a part of the first layers arranged facing the channel is oxidized so as to achieve spacers between the first layers of the source and drain and the gate electrode.
17. The transistor according to claim 1 wherein the channel has a lower thickness and a lower width compared to the connected second layers of the source electrode and of the drain electrode.
18. A transistor comprising:
first layers made from a germanium and silicon compound with a germanium concentration between 0% and 10%,
second layers made from a germanium and silicon compound with a germanium concentration between 10% and 50%,
a source electrode and a drain electrode, each formed by an alternation of first layers and the second layers,
a top channel connecting a top second layer of the source electrode to a top second layer of the drain electrode,
a bottom channel connecting a bottom second layer of the source electrode to a bottom second layer of the drain electrode,
a gate electrode encasing the top and bottom channels,
wherein each channel has a greater germanium concentration compared to the associated second layer.