Immersion lithography laser light source with pulse stretcher
View Patent ↗An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
1. An apparatus comprising:
a pulsed gas discharge laser lithography light source comprising:
a seed laser portion providing a seed laser output light beam of seed pulses;
an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses;
a pulse stretcher increasing the number of peaks in the output pulse and decreasing the average peak intensity of each of the output pulses by passing the output pulses through a pair of optical delay paths in series;
the pulse stretcher comprising:
a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path;
a first optical delay path tower containing the first beam splitter;
a second optical delay path tower containing the second beam splitter;
one of the first and second optical delay paths comprising:
a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower;
the other of the first and second optical delay paths comprising:
a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
2. The apparatus of claim 1 further comprising:
the first optical delay path and the second optical delay path being of unequal length.
3. The apparatus of claim 1 further comprising:
the first optical delay path being longer than the second optical delay path.
4. The apparatus of claim 2 further comprising:
the one of the first and second optical delay towers containing mirrors in both of the first and second towers being the longer of the first and second optical delay paths.
5. The apparatus of claim 3 further comprising:
the one of the first and second optical delay towers containing mirrors in both of the first and second towers being the longer of the first and second optical delay paths.
6. The apparatus of claim 4 further comprising:
the longer of the first and second optical delay paths being the first optical delay path.
7. The apparatus of claim 1 further comprising:
the mirrors comprising imaging mirrors.
8. The apparatus of claim 6 further comprising:
the mirrors comprising imaging mirrors.
9. The apparatus of claim 1 further comprising:
the mirrors comprising confocal mirrors.
10. The apparatus of claim 6 further comprising:
the mirrors comprising confocal mirrors.
11. The apparatus of claim 8 further comprising:
the mirrors comprising confocal mirrors.