IP Library Assignment 032420/0153
Patent Assignment
Reel/Frame 032420/0153

Merger

Recorded: 2014-03-12 Pages: 24
Assignor
CYMER, INC.
Executed: 2013-05-30
Assignee
CYMER, LLC
17075 THORNMINT COURT, INTELLECTUAL PROP DEPT - MS/4-2D, SAN DIEGO, CALIFORNIA, 92127
Covered Properties (26)
Laser Produced Plasma Euv Light Source
Patent: 7,671,349 →
Application: 11/786,145 →
Publication: US 2008/0179548
Laser System
Patent: 7,885,309 →
Application: 11/787,180 →
Publication: US 2010/0108913
Extendable Electrode for Gas Discharge Laser
Patent: 7,856,044 →
Application: 11/787,463 →
Publication: US 2007/0253459
Laser Gas Injection System
Patent: 7,835,414 →
Application: 11/796,065 →
Publication: US 2008/0205472
Device and method to create a low divergence, high power laser beam for material processing applications
Patent: 8,803,027 →
Application: 11/805,596 →
Publication: US 2007/0280311
Cross-Flow Fan Impeller for a Transversley Excited, Pulsed, Gas Discharge Laser
Patent: 8,814,522 →
Application: 11/818,829 →
Publication: US 2008/0310960
Laser Produced Plasma Euv Light Source Having a Droplet Stream Produced Using a Modulated Disturbance Wave
Patent: 7,897,947 →
Application: 11/827,803 →
Publication: US 2009/0014668
Gas Management System for a Laser-Produced-Plasma Euv Light Source
Patent: 7,655,925 →
Application: 11/897,644 →
Publication: US 2009/0057567
Ultraviolet Laser Light Source Pulse Energy Control System
Patent: 7,830,942 →
Application: 11/900,527 →
Publication: US 2009/0067457
Immersion Lithography Laser Light Source with Pulse Stretcher
Patent: 7,643,528 →
Application: 11/973,671 →
Publication: US 2009/0080476
Laser System
Patent: 7,999,915 →
Application: 11/981,450 →
Publication: US 2008/0165337
System Managing Gas Flow Between Chambers of an Extreme Ultraviolet (Euv) Photolithography Apparatus
Patent: 7,812,329 →
Application: 12/002,073 →
Publication: US 2009/0154642
Method and Apparatus for Vibration Reduction in Laser System Line Narrowing Unit Wavelength Selection Optical Element
Patent: 7,659,529 →
Application: 12/002,939 →
Publication: US 2008/0251738
Drive Laser for Euv Light Source
Patent: 7,916,388 →
Application: 12/004,905 →
Publication: US 2009/0161201
Illumination Apparatus and Method for Controlling Energy of a Laser Source
Patent: 8,723,073 →
Application: 12/027,442 →
Publication: US 2009/0201955
Method and Apparatus for Stabilizing and Tuning the Bandwidth of Laser Light
Patent: 7,822,084 →
Application: 12/082,253 →
Publication: US 2008/0232408
Laser Lithography System with Improved Bandwidth Control
Patent: 7,899,095 →
Application: 12/082,301 →
Publication: US 2008/0253413
Blind Motorized Coupling Arrangements for Coupling Uv Light Source Subsystem and Scanner Subsystem in a Uv Lithography System and Methods Therefor
Patent: 8,061,923 →
Application: 12/210,086 →
Publication: US 2010/0067983
Systems and Methods for Target Material Delivery in a Laser Produced Plasma Euv Light Source
Patent: 7,872,245 →
Application: 12/214,736 →
Publication: US 2009/0230326
Debris protection system having a magnetic field for an EUV light source
Patent: 8,519,366 →
Application: 12/221,822 →
Publication: US 2010/0032590
Very High Power Laser Chamber Optical Improvements
Patent: 8,284,815 →
Application: 12/577,077 →
Publication: US 2010/0098120
Extendable Electrode for Gas Discharge Laser
Patent: 8,446,928 →
Application: 12/945,719 →
Publication: US 2011/0058580
Laser System
Patent: 8,170,078 →
Application: 12/987,039 →
Publication: US 2011/0102759
Laser System
Patent: 8,908,735 →
Application: 13/231,882 →
Publication: US 2012/0002687
Extendable Electrode for Gas Discharge Laser
Patent: 8,526,481 →
Application: 13/469,009 →
Publication: US 2012/0219032
Laser-Produced-Plasma Euv Light Source
Patent: 8,785,892 →
Application: 13/493,871 →
Publication: US 2012/0305810
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Corrective Assignment to Correct the Receiving Party from Carl Zeiss Smt Ag to Carl Zeiss Laser Optics Gmbh Previously Recorded on Reel 020694 Frame 0095. Assignor(S) Hereby Confirms the Correction. Mar 24, 2014
From: WEIGL, BERNHARD; SANDSTROM, RICK
To: CARL ZEISS LASER OPTICS GMBH
Reel/Frame 032513/0299 →
Assignment of Assignor's Interest May 9, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032860/0748 →
Merger Sep 22, 2016
From: CARL ZEISS LASER OPTICS GMBH
To: CARL ZEISS SMT GMBH
Reel/Frame 040107/0446 →