Method of growing III group nitride single crystal and III group nitride single crystal manufactured by using the same

1. A method of growing a III group nitride single crystal by using a metal-organic chemical vapor deposition (MOCVD) process, the method comprising:

preparing an r-plane (1-102) substrate;

forming a nitride-based nucleation layer on the substrate; and

growing a nonpolar a-plane (11-20) gallium nitride single crystal on the nitride-based nucleation layer while alternately increasing and decreasing a ratio of V/III group to alternate between a horizontal growth mode and a vertical growth mode.

2. The method of claim 1 , further comprising thermally processing the substrate, between the preparing an r-plane (1-102) substrate and the forming a nitride-based nucleation layer.

3. The method of claim 2 , wherein the thermally processing the substrate is performed at a temperature of 1000 to 1200° C.

4. The method of claim 1 , wherein the forming a nitride-based nucleation layer is performed at a temperature of 500 to 600° C.

5. The method of claim 1 , wherein a thickness of the nitride-based nucleation layer is 20 to 50 nm.

6. The method of claim 1 , wherein the ratio of V/III group of the vertical growth mode is within a range of 1300 to 1900, and the ratio of V/III group of the horizontal growth mode is within a range of 130 to 190.

7. The method of claim 6 , wherein, in the growing a nonpolar a-plane nitride gallium single crystal, the alternately increasing and decreasing a ratio of V/III group is performed 10 times or more at an interval of 15 to 60 seconds.

8. The method of claim 7 , wherein a time ratio of the horizontal growth mode to the vertical growth mode is within a range of 1 to 1.5.

9. The method of claim 6 , wherein the altering increase and decrease of a ratio of V/III group is performed by increasing and decreasing a flux of a nitrogen source gas.