IP Library Granted Patent US 7,470,922
Granted Patent B2
US 7,470,922 · App. 11/986,350 · Granted Dec 30, 2008

Increasing adherence of dielectrics to phase change materials

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Quick Facts
Patent No.
US 7,470,922
App. No.
11/986,350
Granted
Dec 30, 2008
Kind
B2
Abstract

A phase change material is formed over a dielectric material. An impurity is introduced into the dielectric to improve the adherence of said dielectric to said phase change material.

Claims (6)

1. A phase change memory comprising:

a phase change material; and

a dielectric in contact with said phase change material, said dielectric including an impurity to improve the adherence of the dielectric to said phase change material.

2. A memory according to claim 1 , wherein said impurity is selected in the group consisting of: Si, As, Sb, Ge, B, In, Ti, P, Mo, and W.

3. A memory according to claim 1 , wherein said impurity is silicon at a concentration of between 10 16 and 10 23 atoms/cm 3 .

4. A memory according to claim 1 , wherein said impurity is an ion implanted impurity.

Assignments (2)
CHANGE OF NAME Recorded Jul 18, 2016
From: CARLOW INNOVATIONS, LLC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039379/0077 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2015
From: OVONYX, INC.
To: CARLOW INNOVATIONS LLC
Reel/Frame 037244/0954 →