Semiconductor device manufacturing method and semiconductor device manufacturing system
A semiconductor device manufacturing method and a semiconductor device manufacturing system for irradiating a first laser light ( 50 ) and a second laser light ( 52 ) with a wavelength different from that of the first laser light to a substrate ( 46 ) to perform a thermal processing on the substrate are provided. In the step for performing the thermal processing, at least one of an irradiation intensity and an irradiation time of a first laser and a second laser is controlled to control a temperature distribution in the substrate or a film on the substrate in a depth direction.
1. A semiconductor device manufacturing method comprising simultaneously irradiating a first laser light and a second laser light with a wavelength different from that of the first laser light to a same surface of a semiconductor substrate to perform a thermal processing for activating ion implanted impurity in the semiconductor substrate so that an n-type or p-type diffusion region is formed in the semiconductor, substrate and a temperature of an entire area around the semiconductor substrate in a depth direction is lower than a melting point of the semiconductor substrate, an irradiation time of the first laser light and an irradiation time of the second laser light being controlled so that a temperature distribution in the semiconductor substrate in the depth direction is controlled, wherein:
any one of the first laser light and the second laser light is continuous wave laser light, and the other of the first laser light and the second laser light is pulse laser light;
the irradiation time of the any one of the first laser light and the second laser light is controlled by adjusting a moving speed and a beam spot size in a moving direction on the semiconductor substrate; and
the irradiation time of the other of the first laser light and the second laser light is controlled based on a pulse width.
2. The semiconductor device manufacturing method according to claim 1 , wherein:
the semiconductor substrate is a silicon substrate, a wavelength of the first laser light is 370 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 900 nm or less.
3. The semiconductor device manufacturing method according to claim 2 , wherein:
the wavelength of the first laser light is 450 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 850 nm or less.
4. The semiconductor device manufacturing method according to claim 1 , wherein each of the first laser light and the second laser light is irradiated from a laser selected from a group including an excimer laser, a CO2 laser, a YAG laser (fundamental wave or harmonic), a YVO4 laser (fundamental wave or harmonic), a YLF laser (fundamental wave or harmonic), YAIO3 laser (fundamental wave or harmonic), a glass laser (fundamental wave or harmonic), a ruby laser, an alexandrite laser (fundamental wave or harmonic), a Ti:sapphire laser (fundamental wave or harmonic), a helium-cadmium laser, a copper vapor laser, a gold vapor laser and a semiconductor laser.
5. The semiconductor device manufacturing method according to claim 1 , further comprising forming an operation layer on a front surface of the semiconductor substrate, wherein in performing the thermal processing, the first laser light and the second laser light are irradiated to a back surface of the semiconductor substrate.
6. The semiconductor device manufacturing method according to claim 1 , wherein:
the semiconductor substrate is a silicon substrate;
performing the thermal processing is activating an impurity implanted in the silicon substrate; and
a wavelength of the first laser light is 450 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 850 nm or less.
7. A semiconductor device manufacturing method comprising simultaneously irradiating a first laser light and a second laser light with a wavelength different from that of the first laser light to a same surface of a semiconductor substrate to perform a thermal processing for activating ion implanted impurity in the semiconductor substrate so that an n-type or p-type diffusion region is formed in the semiconductor substrate and a temperature of an entire area around the semiconductor substrate in a depth direction is lower than a melting point of the semiconductor substrate, an irradiation time of the first laser light and the second laser light being controlled so that a temperature distribution in the semiconductor substrate in the depth direction is controlled, wherein:
each of the first laser light and the second laser light is continuous wave laser light;
moving speeds of the first laser light and the second laser light to the semiconductor substrate are the same, and
the irradiation time is controlled by adjusting each of beam spot sizes of the first laser light and the second laser light in a moving direction.
8. A semiconductor device manufacturing system including a first laser for irradiating a first laser light, and a second laser for irradiating a second laser light with a wavelength different from that of the first laser light, in which the first laser light and the second laser light are simultaneously irradiated to a same surface of a semiconductor substrate to perform a thermal processing for activating ion implanted impurity in the semiconductor substrate so that an n-type or p-type diffusion region is formed in the semiconductor substrate and a temperature of an entire area around the semiconductor substrate in a depth direction is lower than a melting point of the semiconductor substrate, an irradiation time of the first laser light and the second laser light being controlled so that a temperature distribution in the semiconductor substrate in the depth direction is controlled, wherein:
any one of the first laser light and the second laser light is continuous wave laser light, and the other of the first laser light and the second laser light is pulse laser light;
the irradiation time of said any one of the first laser light and the second laser light is controlled by adjusting a moving speed and a beam spot size in a moving direction on the semiconductor substrate; and
the irradiation time of said the other of the first laser light and the second laser light is controlled based on a pulse width.
9. The semiconductor device manufacturing method according to claim 8 , wherein:
the semiconductor substrate is a silicon substrate, a wavelength of the first laser light is 370 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 900 nm or less.
10. The semiconductor device manufacturing method according to claim 9 , wherein:
the wavelength of the first laser light is 450 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 850 nm or less.
11. The semiconductor device manufacturing system according to claim 8 , wherein each of the first laser light and the second laser light is irradiated from a laser selected from a group including an excimer laser, a CO2 laser, a YAG laser (fundamental wave or harmonic), a YVO4 laser (fundamental wave or harmonic), a YLF laser (fundamental wave or harmonic), YAIO3 laser (fundamental wave or harmonic), a glass laser (fundamental wave or harmonic), a ruby laser, an alexandrite laser (fundamental wave or harmonic), a Ti:sapphire laser (fundamental wave or harmonic), a helium-cadmium laser, a copper vapor laser, a gold vapor laser and a semiconductor laser.
12. The semiconductor device manufacturing system according to claim 8 , wherein:
the semiconductor substrate is a silicon substrate;
performing the thermal processing is activating an impurity implanted in the silicon substrate; and
a wavelength of the first laser light is 450 nm or more, and a wavelength of the second laser light is more than that of the first laser light and is 850 nm or less.
13. A semiconductor device manufacturing system including a first laser for irradiating a first laser light, and a second laser for irradiating a second laser light with a wavelength different from that of the first laser light, in which the first laser light and the second laser light are simultaneously irradiated to a same surface of a semiconductor substrate to perform a thermal processing for activating ion implanted impurity in the semiconductor substrate so that an n-type or p-type diffusion region is formed in the semiconductor substrate and a temperature of an entire area around the semiconductor substrate in a depth direction is lower than a melting point of the semiconductor substrate, an irradiation time of the first laser light and the second laser light being controlled so that a temperature distribution in the semiconductor substrate in the depth direction is controlled, wherein:
each of the first laser light and the second laser light is continuous wave laser light;
moving speeds of the first laser light and the second laser light to the semiconductor substrate are the same, and
the irradiation time is controlled by adjusting each of beam spot sizes of the first laser light and the second laser light in a moving direction.