Sample chamber and method for the production thereof
The invention relates to a sample chamber with a cover plate and a bottom plate which is joined thereto in a fixed manner, wherein a recess is provided in the cover plate so that a reservoir is formed by the bottom plate, wherein a planar element with holes is provided in the reservoir, wherein the holes have a predetermined arrangement and/or size.
1. Method of manufacturing a sample chamber with a cover plate and a bottom plate joined thereto in a fixed manner, the cover plate being provided with a recess, so that a reservoir is formed by the bottom plate, a planar element with openings having at least one of a predetermined arrangement and size provided in the reservoir, the method comprising:
provision of a cover plate and a bottom plate, wherein a recess is provided in the cover plate to form a reservoir with the bottom plate and wherein the surface of the cover plate opposite the recess has a planar region and a prominence;
treatment of a region of the surface of at least one of the cover plate and the bottom plate to obtain an adhesion layer; and
pressing the cover plate and bottom plate together in order to join them by means of the adhesive layer, wherein the planar region and the prominence are at least partially subjected to pressure in separate steps.
2. Method according to claim 1 , wherein the planar element comprises a fabric.
3. Method according to claim 2 , wherein the fabric is a mesh or a film.
4. Method according to claim 1 , wherein the planar element is arranged parallel to the bottom plate.
5. Method according to claim 1 , wherein the planar element is clamped between the bottom plate and the cover plate.
6. Method according to claim 1 , wherein at least one of the openings in the planar element has a diameter of 2-500 μm, the planar element has a thickness of 3-500 μm, and the planar element has a distance to the bottom plate of 0-100 μm.
7. Method according to claim 6 , wherein the holes openings in the planar element have diameters of 10-200 μm.
8. Method according to claim 6 , wherein the planar element has a thickness of 40-300 μm.
9. Method according to claim 6 , wherein the planar element has a distance to the bottom plate of 0-10 μm.
10. Method according to claim 1 , wherein the planar element has at least one of a predetermined colour, a predetermined intrinsic fluorescence lower or equal to the intrinsic fluorescence of COC or COP, and a predetermined refractive index higher than 1.2 and lower than 1.7.
11. Method according to claim 1 , wherein the planar element comprises at least partially a material which is soluble in solvent.
12. Method according to claim 1 , wherein the recess in the cover plate has a base so that a cavity is formed by the bottom plate.
13. Method according to claim 1 , wherein at least one of the cover plate and the bottom plate has a channel opening into the reservoir from outside.
14. Method according to claim 13 , wherein the channel is a through hole.
15. Method according to claim 1 , wherein the bottom plate has a thickness of 50-250 μm.
16. Method according to claim 15 , wherein the bottom plate has a thickness of 100-200 μm.
17. Method according to claim 1 , wherein at least one of the cover plate, the bottom plate and the planar element comprise a plastic.
18. Method according to claim 17 , wherein the plastic is at least one of without double refraction and intrinsic fluorescence.
19. Method according to claim 1 , wherein at least one of the bottom plate, the cover plate and the planar element are joined using adhesive, solvent, UV treatment, radioactive treatment, laser treatment or thermal welding.
20. Method according to claim 1 , wherein the treatment comprises a strip-shaped heating of at least one of the bottom plate and cover plate above the material melting point along their edges.
21. Method of surface treatment for the hydrophilisation of a reservoir surface in a sample chamber according to claim 1 , wherein the sample chamber comprises a cover plate and a bottom plate joined thereto in a fixed manner, wherein a recess with a base is provided in the cover plate so that a cavity reservoir is formed by the bottom plate, the method comprising:
plasma treatment of the reservoir surface, wherein the plasma a waste gas of the plasma is passed through the cavity reservoir.
22. Method according to claim 21 , wherein an atmospheric plasma, is used for the plasma treatment.
23. Method according to claim 22 , wherein the atmospheric plasma includes nitrogen as the active gas.
24. Method according to claim 21 , wherein the plasma treatment comprises cooling of at least one of the plasma and the sample chamber.