IP Library › Granted Patent US 7,777,213
Granted Patent B2
US 7,777,213 · App. 12/000,379 · Granted Aug 17, 2010

Phase change layer including indium and method of manufacturing the same and phase change memory device comprising phase change layer including indium and methods of manufacturing and operating the same

Assignee: Samsung Electronics Co., Ltd.
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Quick Facts
Patent No.
US 7,777,213
App. No.
12/000,379
Granted
Aug 17, 2010
Kind
B2
Abstract

Provided are a phase change layer and a method of forming the phase change layer and a phase change memory device including the phase change layer, and methods of manufacturing and operating the phase change memory device. The phase change layer may be formed of a quaternary compound including an amount of indium (In) ranging from about 15 at. % to about 20 at. %. The phase change layer may be In a Ge b Sb c Te d , wherein an amount of germanium (Ge) ranges from about 10 at. %≦b≦about 15 at. %, an amount of antimony (Sb) ranges from about 20 at. %≦c≦about 25 at. %, and an amount of tellurium (Te) ranges from about 40 at. %≦d≦about 55 at. %.

Claims (9)

1. A phase change layer comprising a quaternary compound including an amount a of indium (In) in a range of about 15 at. % about 20 at. %, wherein the quaternary compound is In a Ge b Sb c Te d (IGST), and wherein an amount b of germanium (Ge) is in a range of about 10 at. % about 15 at. %, an amount c of antimony (Sb) is in a range of about 20 at. % c about 25 at. %, and an amount d of tellurium (Te) is in a range of about 40 at. % d about 55 at. %.

2. A phase change memory device comprising:

a storage node including the phase change layer of claim 1 ; and

a switching element connected to the storage node.

3. A method of operating the phase change memory device of claim 2 comprising:

maintaining the switching element in an ON state; and

applying an operating voltage to the storage node.

4. The method of claim 3 , wherein the quaternary compound is In a Ge b Sb c Te d (IGST), and wherein an amount b of germanium (Ge) is in a range of about 10 at. %≦b≦about 15 at. %, an amount c of antimony (Sb) is in a range of about 20 at. %≦c≦about 25 at. %, and an amount d of tellurium (Te) is in a range of about 40 at. %≦d≦about 55 at. %.

5. The method of claim 3 , wherein the operating voltage is one of a write voltage, a read voltage, and an erase voltage.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2007
From: KANG, YOUN-SEON; NOH, JIN-SEO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 020282/0888 →
Priority Claims (1)
KR 10-2007-0005816 · Jan 18, 2007 · national
Continuity (1)
Related Publication 20080175042A1 · Jul 24, 2008