IP Library Granted Patent US 7,875,954
Granted Patent B2
US 7,875,954 · App. 12/000,514 · Granted Jan 25, 2011

Semiconductor chip

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Quick Facts
Patent No.
US 7,875,954
App. No.
12/000,514
Granted
Jan 25, 2011
Kind
B2
Abstract

Provided is a semiconductor chip ( 1 ) including: at least one fuse element ( 21 ); a fuse opening ( 17 ) formed above the fuse element ( 21 ); and a discharge electrode ( 31 ) that is formed below a bottom portion ( 17 a ) of the fuse opening ( 17 ), and is formed in one of the same layer with the fuse element ( 21 ) and the above layer of the fuse element ( 21 ). Accordingly, the current caused to flow due to the electrostatic discharge generated at the time of assembling the semiconductor chip can be discharged through the discharge electrode ( 31 ). As a result, the current caused to flow due to the electrostatic discharge generated at the time of assembling the semiconductor chip can be prevented from being discharged through the fuse element, whereby a problem in that a functional failure occurs in the semiconductor chip can be solved.

Claims (15)

1. A semiconductor chip comprising:

a fuse element;

an insulating film formed over said fuse element;

an opening formed in said insulating film, said opening having a bottom; and

discharge electrode formed below said bottom,

wherein the discharge electrode is formed at a position closer to a carrying region of said chip than the fuse element, said chip being movable when carried at said carrying region.

2. The semiconductor chip according to claim 1 wherein a part of the discharge electrode is formed at an area inside of an outer periphery of said bottom.

3. The semiconductor chip according to claim 1 wherein the discharge electrode is formed between a central portion of the semiconductor chip and the fuse element.

4. The semiconductor chip according to claim 1 wherein the discharge electrode is formed between an outer periphery of the semiconductor chip and the fuse element.

5. The semiconductor chip according to claim 4 , wherein the discharge electrode is formed between said opening and a scribe region.

6. The semiconductor chip according to claim 4 , wherein the discharge electrode is formed between said opening and a region in which a pad is formed.

7. The semiconductor chip according to claim 1 wherein:

the fuse element and the discharge electrode are formed above a semiconductor substrate; and

the discharge electrode is connected to the semiconductor substrate through a contact.

8. The semiconductor chip according to claim 1 wherein said discharge electrode is formed in one of the same layer as the fuse element and a layer above the fuse element.

Assignments (2)
CHANGE OF NAME Recorded Nov 2, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025235/0423 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2007
From: MITANI, HITOSHI
To: NEC ELECTRONICS CORPORATION
Reel/Frame 020282/0790 →