IP Library › Patent Application 12000624
Patent Application
App. No. 12/000,624

Surface processing apparatus

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Quick Facts
Patent No.
US None
App. No.
12/000,624
Abstract

A surface processing apparatus includes a process chamber including a gas ejection mechanism; an exhaust for exhausting the inside of said process chamber; and a gas supply for supplying a gas to the gas ejection mechanism. The gas ejection mechanism includes a first gas distribution mechanism for distributing the gas into a cooling or heating mechanism, including a gas distribution plate placed in the frame member, the gas distribution plate having a plurality of holes that extend therethrough, the cooling or heating mechanism having multiple gas passages that extend therethrough, the plate having a number of outlets to eject the gas into the process chamber, wherein there are more outlets in the plate than there are gas passages, and the plate is fixed to a second gas distribution mechanism with a clamping member.

Claims (16)

1 . A substrate surface processing apparatus comprising:

a process chamber in which a substrate holding mechanism holding a substrate and a gas ejection mechanism are arranged to face each other;

an exhaust for exhausting the inside of said process chamber; and

a gas supply for supplying a gas to the gas ejection mechanism;

said gas ejection mechanism comprising, in order from the upstream:

a gas diffusion space communicated with said gas supply, said gas diffusion space having a gas diffusion plate therein;

a cooling or heating mechanism including a coolant channel or a heater and having a plurality of gas passages; and

a plate having a plurality of gas outlets which are communicated with said plurality of gas passages, said plate fixed on said cooling or heating mechanism with a fixing means.

2 . The surface processing apparatus according to claim 1 , wherein said gas outlets are formed in the said plate under said coolant channel or heater.

3 . The surface processing apparatus according to claim 1 , wherein said gas ejection mechanism is connected with a high frequency power source so that a plasma is generated to carry out processing by feeding high frequency electric power to said gas ejection mechanism.

4 . The surface processing apparatus according to claim 1 , wherein the diameter of said gas outlets is 0.01-1 mm.

5 . The surface processing apparatus according to claim 1 , wherein a ruggedness is formed on contact surfaces of said plate and said cooling or heating mechanism to engaged with each other.

6 . The surface processing apparatus according to claim 1 , wherein said plate is fixed to said cooling or heating mechanism through a heat conductive sheet.

7 . The surface processing apparatus according to claim 1 , wherein said plate is made from at least one selected from the group consisting of Si, SiO 2 , SiC, and carbon.

8 . The surface processing apparatus according to claim 1 , wherein said fixing means is an electrostatic checking mechanism.

9 . The surface processing apparatus according to claim 1 , wherein said fixing means is a clamping member which clamps the periphery of said plate