IP Library Granted Patent US 7,919,869
Granted Patent B2
US 7,919,869 · App. 12/040,950 · Granted Apr 5, 2011

Semiconductor device and method of visual inspection and apparatus for visual inspection

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Quick Facts
Patent No.
US 7,919,869
App. No.
12/040,950
Granted
Apr 5, 2011
Kind
B2
Abstract

A semiconductor device having the structure, which is adopted for the highly precise visual inspection with a lower cost, is achieved. A semiconductor device is a semiconductor device having a region for forming an electric circuit, and includes seal rings provided in an interconnect layer and surrounding the region for forming an electric circuit, and a dummy metal via provided in the interconnect layer and located outside of the seal rings. In a cross section perpendicular to an elongating direction of the seal ring, the width of the dummy metal via is smaller than the width of the seal ring.

Claims (9)

1. A semiconductor device having a region for forming an electric circuit, comprising:

a guard ring, provided in an interconnect layer, and surrounding said region for forming the electric circuit; and

at least one dummy metal via, provided in said interconnect layer and located outside of said guard ring;

wherein a width of said dummy metal via is smaller than a width of said guard ring in a cross section that is perpendicular to a direction of an elongation of said guard ring, and an area between the region for forming the electric circuit and the guard ring is void of the at least one dummy metal via.

2. The semiconductor device as set forth in claim 1 , wherein said at least one dummy metal via is provided over the entire peripheral of said region for forming the electric circuit.

3. The semiconductor device as set forth in claim 1 , wherein said at least one dummy metal via is composed of aluminum (Al), copper (Cu) or tungsten (W).

4. The semiconductor device as set forth in claim 1 , wherein said at least one dummy metal via is provided in a section between the guard ring and scribe lines of the semiconductor device.

5. The semiconductor device as set forth in claim 1 , wherein said at least one dummy metal via includes a plurality of dummy metal vias, each formed in a section between the guard ring and scribe lines of the semiconductor device.

6. The semiconductor device as set forth in claim 5 , wherein each of the plurality of dummy metal vias is disposed adjacent to each other.

Assignments (2)
CHANGE OF NAME Recorded Nov 2, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025235/0423 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 3, 2008
From: KUMAGAI, HOKUTO
To: NEC ELECTRONICS CORPORATION
Reel/Frame 020587/0552 →