Method of manufacturing nanoelectrode lines using nanoimprint lithography process

1. A method of manufacturing nanoelectrode lines, comprising the steps of:

sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate;

disposing an imprint mold having a plurality of molding patterns over the second photoresist;

applying pressure to the mold to allow the second photoresist to flow into the mold patterns;

irradiating ultraviolet (UV) light onto the mold to cure the second photoresist;

removing the mold from the cured second photoresist and patterning the second photoresist;

patterning the first photoresist layer using the patterned second photoresist as a mask;

patterning the insulating layer using the patterned first photoresist layer and the patterned second photoresist as a mask, such that the patterned insulating layer includes a plurality of concave portions and a plurality of convex portions, and each convex portion is formed under the patterned first photoresist layer; and

forming a metal layer on each concave portion of the patterned insulating layer.

2. The method according to claim 1 , wherein the steps of patterning the second photoresist and patterning the insulating layer are performed using halogen plasma.

3. The method according to claim 1 , wherein the step of patterning the first photoresist layer is performed using oxygen (O 2 ) plasma.

4. The method according to claim 1 , wherein the insulating layer is formed of one selected from the group consisting of SiO 2 , SiN x , and alumina.

5. The method according to claim 1 , wherein the step of forming the metal layer comprises the sub-steps of:

coating the metal layer on the entire surface of the substrate; and

removing the patterned first photoresist layer and the second photoresist.

6. The method according to claim 5 , wherein the step of removing the first photoresist layer and the second photoresist is performed using a liftoff process.

7. The method according to claim 6 , wherein the first photoresist layer and the second photoresist are formed of photoresist having a strong solubility against acetone.

8. The method according to claim 7 , wherein the first photoresist layer and the second photoresist are one of polymethyl methacrylate (PMMA) and resin.

9. The method according to claim 1 , further comprising the step of forming an active layer for an electronic device on the metal layer after forming the metal layer.

10. The method according to claim 8 , wherein the active layer formed on the metal layer is formed of at least one of an organic molecular material and a polymer material.

11. The method according to claim 1 , wherein the step of forming the metal layer comprises the sub-steps of:

coating the metal layer both on the concave portions of the patterned insulating layer and on the patterned second photoresist;

forming an active layer on the coated metal layer; and

removing the patterned first photoresist layer, the patterned second photoresist, the metal layer formed on the patterned second photoresist and the active layer formed on the patterned second photoresist, such that each convex portion of the insulating layer is exposed, and the metal layer disposed on each concave portion of the insulating layer is interposed between two adjacent convex portions of the insulating layer.