IP Library Granted Patent US 7,785,546
Granted Patent B2
US 7,785,546 · App. 12/049,641 · Granted Aug 31, 2010

Apparatus and method for manufacturing high purity polycrystalline silicon

Assignee: Chisso Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,785,546
App. No.
12/049,641
Granted
Aug 31, 2010
Kind
B2
Abstract

An apparatus for manufacturing high purity polycrystalline silicon comprises a vertical reactor, a vaporizer and a fusing evaporator for supplying gaseous silicon chloride and zinc, respectively. The fusing evaporator further comprises a zinc evaporator, a main vertical cylinder part connected to the upper part of the zinc evaporator, a solid trapping pipe inserted in the main vertical cylinder part, a zinc introducing pipe connected to the solid trapping pipe at an angle, a seal pot surrounding the lower portion of the solid trapping pipe, an induction heater surrounding the main vertical cylinder part, and a gas vent pipe connected to the side wall of the zinc evaporator.

Claims (19)

1. An apparatus for manufacturing a high purity polycrystalline silicon, comprising:

a vaporizer of silicon chloride;

a fusing evaporator of zinc;

a vertical reactor provided with a heating means on the peripheral face thereof;

a silicon chloride gas supply nozzle disposed to connect the vaporizer of silicon chloride and the vertical reactor and for supplying a silicon chloride gas supplied from the vaporizer of silicon chloride into the vertical reactor;

a zinc gas supply nozzle disposed to connect the fusing evaporator of zinc and the vertical reactor and for supplying a zinc gas supplied from the fusing evaporator of zinc into the vertical reactor; and

an exhaust gas vent pipe connected to the vertical reactor,

the fusing evaporator of zinc, further comprising:

a zinc evaporator;

a main vertical cylinder part connected to the upper part of the zinc evaporator;

a solid trapping pipe inserted into the main vertical cylinder part;

a zinc introducing pipe connected to the solid trapping pipe at an angle;

a seal pot disposed to surround the lower end opening portion of the solid trapping pipe and for configuring the bottom face of solid trapping pipe;

an induction heater disposed on the peripheral face of the main vertical cylinder part and capable of controlling a temperature; and

a gas vent pipe connected to the side wall of the zinc evaporator.

2. The apparatus for manufacturing a high purity polycrystalline silicon as defined in claim 1 , wherein a reinforcement material is attached to the outside of the zinc evaporator.

3. The apparatus for manufacturing a high purity polycrystalline silicon as defined in claim 1 , wherein the seal pot is attached to the solid trapping pipe.

4. The apparatus for manufacturing a high purity polycrystalline silicon as defined in claim 1 , wherein a cut groove is formed at the upper opening end of the seal pot.

5. The apparatus for manufacturing a high purity polycrystalline silicon as defined in claim 1 , wherein an inert gas introduction pipe is connected to the solid trapping pipe and the main vertical cylinder part.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2011
From: CHISSO CORPORATION
To: JNC CORPORATION
Reel/Frame 026187/0940 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 18, 2008
From: NAMIKI, NOBUAKI
To: CHISSO CORPORATION
Reel/Frame 020832/0664 →
Priority Claims (1)
JP 2007-071076 · Mar 19, 2007 · national
Continuity (1)
Related Publication 20080233037A1 · Sep 25, 2008