Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
View Patent ↗A semiconductor manufacturing apparatus includes a chamber, a gas supplier, a vacuum pump, an electrode, a conductive knitted wire mesh and a radio frequency power supply. The electrode is placed outside of the chamber and fixed to the chamber. The gas supplier supplies gas into the chamber. The vacuum pump exhausts the chamber. The radio frequency power supply supplies radio frequency power to the electrode through the conductive knitted wire mesh.
1. A semiconductor manufacturing apparatus comprising:
a chamber;
a gas supplier configured to supply gas into said chamber;
a vacuum pump configured to exhaust said chamber;
an electrode which is placed outside of said chamber and fixed to the chamber;
a conductive knitted wire mesh; and
a radio frequency power supply configured to supply radio frequency power to said electrode through said conductive knitted wire mesh.
2. The semiconductor manufacturing apparatus according to claim 1 , wherein said conductive knitted wire mesh is a knitted copper wire mesh.
3. The semiconductor manufacturing apparatus according to claim 2 , wherein said knitted copper wire mesh is covered with a chrome-plated film.
4. The semiconductor manufacturing apparatus according to claim 1 , wherein said conductive knitted wire mesh connects said radio frequency power supply and said electrode in a curved or bent state.