Defect inspection and charged particle beam apparatus
View Patent ↗In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
1. An inspection apparatus, comprising:
a charged particle beam source;
a stage for mounting a specimen;
a lens for converging the charged particle beam on to the specimen;
a deflector for deflecting the charged particle beam;
a detector for detecting charged particle beam emission from the specimen;
a display apparatus for displaying a specimen image in accordance with a signal from the detector, wherein the display apparatus further comprises:
a memory for storing information of relative relation between a coordinate of a position on the specimen obtained by carrying out an alignment between the specimen image and a layout image of a wiring pattern of the specimen, and a coordinate of the layout image; and
a processing apparatus for converting a shift amount of the specimen image by the deflector of the charged particle beam into a shift amount of the layout image in accordance with the information stored in the memory, wherein
the processing apparatus displays the specimen image and the layout image of the wiring pattern of the specimen in coordinate on the display apparatus, and
when the specimen image is shifted by the amount of the specimen shift, the layout image is displayed by shifting by the amount of the layout shift.
2. An inspection apparatus according to claim 1 , wherein:
the inspection apparatus includes a memory for storing wiring pattern information of the specimen and the processing apparatus obtains wiring pattern information shifted by the shift amount,
and the layout image which is shifted by the shift amount from the layout image is displayed in accordance with the wiring pattern information.
3. An inspection apparatus according to claim 1 , wherein the specimen image and the layout image are displayed in piles on the display apparatus.
4. An inspection apparatus according to claim 1 , further including another deflector for optical axis alignment of the charged particle beam other than the deflector.
5. An inspection apparatus, comprising:
a charged particle beam source;
a stage for mounting a specimen;
a lens for converging the charged particle beam on to the specimen;
a deflector for deflecting the charged particle beam;
a detector for detecting charged particle beam emission from the specimen;
a display apparatus for displaying a specimen image in accordance with a signal from the detector, wherein the display apparatus further comprises:
a memory for storing information of relative relation between a coordinate of a position on the specimen obtained by carrying out an alignment between the specimen image and a layout image of a wiring pattern of the specimen, and a coordinate of the layout image; and
a processing apparatus for converting a shift amount of the specimen image by the deflector of the charged particle beam into a shift amount of the layout image in accordance with the information stored in the memory, wherein:
the processing apparatus displays the specimen image and the layout image of the wiring pattern of the specimen in coordinate on the display apparatus, and
when the layout image is shifted by the shift amount of the layout, the specimen image is displayed by shifting by the shift amount of the specimen by way of deflecting the charged particle beam by the deflector.
6. An inspection apparatus according to claim 5 , wherein:
the inspection apparatus includes a memory for storing wiring pattern information of the specimen and the processing apparatus obtains wiring pattern information shifted by the shift amount, wherein and
a layout image which is shifted by shift amount from the layout image is displayed on the display in accordance with the wiring pattern information.
7. An inspection apparatus according to claim 6 , wherein the specimen image and the layout image are displayed in piles on the display apparatus.
8. An inspection apparatus according to claim 5 , wherein the specimen image and the layout image are displayed in piles on the display apparatus.
9. An inspection apparatus according to claim 5 , further including another deflector for optical axis alignment of the charged particle beam other than the deflector.