IP Library Granted Patent US 8,558,999
Granted Patent B2
US 8,558,999 · App. 12/078,097 · Granted Oct 15, 2013

Defect inspection apparatus and method utilizing multiple inspection conditions

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,558,999
App. No.
12/078,097
Granted
Oct 15, 2013
Kind
B2
Abstract

To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.

Claims (12)

1. An inspection apparatus comprising:

an irradiation system which irradiates a substrate with light;

a plurality of detectors arranged in a plurality of directions relative to said substrate, each detector configured to detect light from said substrate and generate a plurality of signals;

a plurality of channels, each channel coupled to a respective one of said detectors and configured to receive a signal from the respective detector; and

an electronic filter for comparing one of said signals against a threshold, wherein:

said electronic filter is configured to filter out said one signal and filter out said other signals if said one signal is less than the threshold, or said electronic filter is configured to pass said one signal and pass said other signals if said one signal exceeds the threshold.

2. An inspection method comprising steps of:

irradiating a substrate with light by way of an irradiation system;

detecting light from said substrate by a plurality of detectors arranged in a plurality of directions relative to said substrate and generating a plurality of signals;

receiving a signal at a plurality of channels, each channel coupled to a respective one of said detectors and configured to receive a signal from the respective detector;

comparing, by way of an electronic filter, one of said signals against a threshold;

filtering out said one signal and said other signals by said electronic filter if said one signal is less than the threshold; or passing said one signal and said other signals by said electronic filter if said one signal exceeds the threshold.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →