Substrate structure and manufacturing method of the same
View Patent ↗After a titanium nitride (TiN) thin film is formed on a silicon substrate, cobalt (Co) fine particles and nickel (Ni) fine particles are deposited in a mixed state on the titanium nitride (TiN) thin film, and CNTs are sequentially grown from the cobalt (Co) fine particles and the nickel fine particles by varying growth conditions.
1. A substrate structure, comprising:
a substrate;
a base material formed in a region above said substrate;
a catalytic material formed in the region; and
a linear structure made of a carbon element and formed on said catalytic material,
wherein said catalytic material contains at least first catalytic fine particles made of a first catalytic material and second catalytic fine particles made of a second catalytic material different from said first catalytic material; and
wherein said linear structure is formed from each of the first and second catalytic fine particles.
2. The substrate structure according to claim 1 ,
wherein the respective catalytic fine particles contain at least one kind of metal selected from the metal group consisting of iron (Fe), nickel (Ni), cobalt (Co), gold (Au), silver (Ag), and copper (Cu), or at least one kind of alloy selected from the alloy group consisting of alloys composed of two kinds or more of iron (Fe), nickel (Ni), cobalt (Co), gold (Au), silver (Ag), and copper (Cu).
3. The substrate structure according to claim 1 ,
wherein the respective catalytic fine particles are formed of the same material.
4. The substrate structure according to claim 1 ,
wherein the respective catalytic fine particles differ in sizes from each other.
5. The substrate structure according to claim 1 ,
wherein the respective catalytic fine particles have an average value of diameters controlled to fall within a range of 1 to 30 nm, and a standard deviation of a diameter distribution controlled to be within 1.5.
6. The substrate structure according to claim 1 ,
wherein said base material contains at least one kind selected from the group consisting of titanium (Ti), tantalum (Ta), titanium nitride (TiN), tantalum nitride (TaN), aluminum (Al), hafnium nitride (HfN), molybdenum (Mo), and titanium silicide (TiSi).
7. A manufacturing method of a substrate structure, comprising:
forming a base material in a region above a substrate;
forming a catalytic material in the region; and
growing a linear structure made of a carbon element using the catalytic material as a nucleus,
wherein the catalytic material is formed by mixing a plurality of kinds of catalytic fine particles each having a different catalytic ability.
8. The manufacturing method of the substrate structure according to claim 7 ,
wherein the respective catalytic fine particles contain at least one kind of metal selected from the metal group consisting of iron (Fe), nickel (Ni), cobalt (Co), gold (Au), silver (Ag), and copper (Cu), or at least one kind of alloy selected from the alloy group consisting of alloys composed of two kinds or more of iron (Fe), nickel (Ni), cobalt (Co), gold (Au), silver (Ag), and copper (Cu).
9. The manufacturing method of the substrate structure according to claim 7 ,
wherein the respective catalytic fine particles are formed of each different material.
10. The manufacturing method of the substrate structure according to claim 9 ,
wherein the linear structures are grown under each different growth condition using the respective catalytic fine particles as the nuclei due to a difference in catalytic abilities of the respective catalytic fine particles, at the time of said growth of the linear structure.
11. The manufacturing method of the substrate structure according to claim 7 ,
wherein the respective catalytic fine particles are formed of the same material.
12. The manufacturing method of the substrate structure according to claim 7 ,
wherein the respective catalytic fine particles differ in sizes from each other.
13. The manufacturing method of the substrate structure according to claim 7 ,
wherein the respective catalytic fine particles have an average value of diameters controlled to fall within a range of 1 to 30 nm, and a standard deviation of a diameter distribution controlled to be within 1.5.
14. The manufacturing method of the substrate structure according to claim 7 ,
wherein the base material contains at least one kind selected from the group consisting of titanium (Ti), tantalum (Ta), titanium nitride (TiN), tantalum nitride (TaN), aluminum (Al), hafnium nitride (HfN), molybdenum (Mo), and titanium silicide (TiSi).