Surfactant Assisted Growth in Barrier Layers In Inverted Metamorphic Multijunction Solar Cells
A method of forming a multijunction solar cell including an upper subcell, a middle subcell, and a lower subcell, the method including: providing a substrate for the epitaxial growth of semiconductor material; forming a first solar subcell on the substrate having a first band gap; forming a second solar subcell over the first solar subcell having a second band gap smaller than the first band gap; forming a barrier layer over the second subcell using a surfactant, preferably a isoelectronic surfactant such as bismuth or antimony; forming a graded interlayer over the barrier layer, the graded interlayer having a third band gap greater than the second band gap; and forming a third solar subcell over the graded interlayer having a fourth band gap smaller than the second band gap such that the third subcell is lattice mismatched with respect to the second subcell.
1 . A method of forming a multijunction solar cell comprising an upper subcell, a middle subcell, and a lower subcell, the method comprising:
providing first substrate for the epitaxial growth of semiconductor material;
forming a first solar subcell on said substrate having a first band gap;
forming a second solar subcell over said first solar subcell having a second band gap smaller than said first band gap;
forming a first barrier layer over said second subcell using a surfactant;
forming a grading interlayer over said first barrier layer, said grading interlayer having a third band gap greater than said second band gap; and
forming a third solar subcell over said grading interlayer having a fourth band gap smaller than said second band gap such that said third subcell is lattice mismatched with respect to said second subcell.
2 . The method as defined in claim 1 , wherein the surfactant is an isoelectronic surfactant.
3 . The method as defined in claim 2 , wherein the surfactant is selected from the group of Bi and Sb.
4 . A method as defined in claim 1 , wherein said first barrier layer is composed of any As, P, N, or Sb based III-V compound semiconductors having a bandgap energy greater than or equal to that of the grading interlayer.
5 . A method as defined in claim 1 , further comprising forming a second barrier layer over said grading interlayer prior to the formation of said third solar subcell.
6 . A method as defined in claim 5 , wherein said second barrier layer is composed of any As, P, N, or Sb based III-V compound semiconductors having a bandgap energy greater than or equal to that of the grading interlayer.
7 . A method as defined in claim 1 , wherein said second solar cell is composed of a GaInP, GaInAs, GaAsSb, or GaInAsN emitter region and a GaInAs, GaAsSb, or GaInAsN base region.
8 . A method as defined in claim 1 , wherein said grading interlayer is composed of any of the As, P, N, Sb based III-V compound semiconductors subject to the constraints of having the in-plane lattice parameter greater or equal to that of the second solar cell and less than or equal to that of the third solar cell, and having a band gap energy greater than that of the second solar cell.
9 . A method as defined in claim 7 , wherein said second solar subcell is composed of an InGaP emitter region and an GaAs base region.
10 . A method as defined in claim 1 , wherein said grading interlayer is composed of InGaAlAs.
11 . A method as defined in claim 1 , further comprising attaching a surrogate second substrate over said third solar cell and removing the first substrate.
12 . A method of manufacturing a solar cell comprising:
providing a first semiconductor substrate;
depositing on a first substrate a sequence of layers of semiconductor material forming a solar cell including a barrier layer grown in the presence of a surfactant;
mounting a surrogate second substrate on top of the sequence of layers; and
removing the first substrate.
13 . The method as defined in claim 12 , wherein the surfactant is selected from the group of Bi and Sb.
14 . The method as defined in claim 12 , wherein the sequence of layers of semiconductor material forms a triple junction solar cell, including top, middle and bottom solar subcells.
15 . The method as defined in claim 12 , wherein the mounting step includes adhering the solar cell to the surrogate substrate.
16 . The method as defined in claim 12 , wherein the surrogate substrate is selected from the group of sapphire, Ge, GaAs, or silicon.
17 . The method as defined in claim 12 , wherein the solar cell is bonded to said surrogate substrate by an adhesive.
18 . The method as defined in claim 12 , wherein the solar cell is eutectically bonded to the surrogate substrate.
19 . The method as defined in claim 12 , further comprising thinning the surrogate substrate to a predetermined thickness.
20 . The method as defined in claim 12 , further mounting the solar cell on a support and removing the surrogate substrate.
21 . The method as defined in claim 20 , wherein the support is a rigid cover glass.
22 . A method as defined in claim 14 , wherein said middle and bottom subcells are lattice mismatched.
23 . A method as defined in claim 22 , further comprising depositing graded interlayer over said barrier layer and disposed between said middle and bottom subcells, said interlayer having a band gap greater than the band gap of said middle subcell.
24 . A method as defined in claim 23 , wherein said graded interlayer is composed of any of the As, P, N, Sb based III-V compound semiconductors subject to the constraints of having the in-plane lattice parameter greater or equal to that of the middle subcell and less than or equal to that of the bottom subcell.
25 . A method as defined in claim 23 , wherein the graded interlayer is composed of (In x Ga 1-x ) y Al 1-y As, with x and y selected such that the band gap of the interlayer remains constant at approximately 1.50 eV.
26 . A multijunction solar cell comprising:
a substrate;
a first solar subcell on said substrate having a first band gap;
a second solar subcell disposed over said first subcell and having a second band gap smaller than said first band gap;
a first barrier layer deposited in the presence of a surfactant disposed over said second subcell for reducing the propagation of threading dislocations;
a grading interlayer disposed over said barrier layer and having a third band gap greater than said second band gap; and
a third solar subcell disposed over said grading interlayer that is lattice mismatched with respect to said middle subcell and having a fourth band gap smaller than said third band gap.
27 . A solar cell as defined in claim 26 , wherein said first barrier layer is composed of any As, P, N, or Sb based III-V compound semiconductors having a bandgap energy greater than or equal to that of the grading interlayer.
28 . A solar cell as defined in claim 26 , further comprising a second barrier layer disposed between said grading interlayer and said third subcell.
29 . A solar cell as defined in claim 28 , wherein said first and said second barrier layer is deposited in the presence of Bi or Sb surfactant.
30 . A solar cell as defined in claim 28 , wherein said second barrier layer is composed of any As, P, N, or Sb based III-V compound semiconductors having a bandgap energy greater than or equal to that of the grading interlayer.
31 . A solar cell as defined in claim 26 , wherein the substrate is selected from the group consisting of germanium or GaAs.
32 . A solar cell as defined in claim 26 , wherein said first solar subcell is composed of InGa(Al)P.
33 . A solar cell as defined in claim 26 , wherein said second solar subcell is composed of an GaInP, GaInAs, GaAsSb, or GaInAsN emitter region and an GaInAs, GaAsSb, or GaInAsN base region.
34 . A solar cell as defined in claim 26 , wherein said third solar subcell is composed of InGaAs.