System and method of predicting problematic areas for lithography in a circuit design
View Patent ↗A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problematic lithographic areas. The method includes identifying surface heights of plurality of tiles of a modeled wafer, and mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles.
1. A method of predicting problematic areas for lithography comprising:
identifying, by a processor, surface heights of a plurality of tiles of a modeled wafer; and
mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles,
wherein an average distance of the surface heights is for a plurality of fields of exposure for each tile which is a three dimensional representation of a surface texture at a location on the modeled wafer.
2. The method of claim 1 , wherein the identifying is performed by a modeling tool prior to reticle and wafer fabrication.
3. The method of claim 1 , further comprising identifying tiles with an average focus offset with a value above a certain specification distance related to a depth of focus for a lithography process.
4. The method of claim 3 , further comprising providing the calculated average offset data to a mask tool.
5. A method of predicting problematic areas for lithography comprising:
identifying, by a processor, surface heights of a plurality of tiles of a modeled wafer; and
mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles,
wherein the identifying surface heights of the plurality of tiles determines a three dimensional texture of the modeled wafer.
6. A method of predicting problematic areas for lithography comprising:
identifying, by a processor, surface heights of a plurality of tiles of a modeled wafer;
mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles; and
predicting an average distance of the surface heights if for a plurality of fields of exposure for each of the plurality of tiles comprises calculating a predetermined number of focal planes for each tile in a reticle field.
7. The method of claim 6 , wherein each of the predetermined number of focal planes contributes to an equal percentage of exposure dose for an entire tile.
8. The method of claim 6 , wherein the predetermined number of focal planes are used to measure surface irregularity in three dimensions.
9. The method of claim 6 , wherein the predetermined number of focal planes are different planes of exposure.
10. The method of claim 6 , wherein each of the plurality of fields of exposure is calculated to find an average focus offset by calculating an average distance along an axis of illumination from a best average focal plane.