Method and apparatus for controlled transient cavitation
View Patent ↗Methods and apparatus for creating and controlling transient cavitation are disclosed. An example method includes selecting a range of bubble sizes to be created in a liquid and selecting characteristics for an acoustic field to be applied to the liquid. The method further includes creating gas bubbles of the selected range of bubble sizes in the liquid, creating an acoustic field with the selected characteristics and subjecting the liquid to the acoustic field. In the example method, at least one of the range of bubble sizes and the characteristics of the acoustic field is selected in correspondence with the other so as to control transient cavitation in the liquid for the selected range of bubble sizes. Particularly, the methods and apparatus may be used for the cleaning of a surface, such as a semiconductor substrate.
1. A method for cleaning a surface comprising:
selecting a range of bubble sizes to be created in a liquid;
selecting characteristics of an acoustic field to be applied to the liquid;
providing a surface to be cleaned in contact with the liquid;
creating gas bubbles of the selected range of bubble sizes in the liquid near the surface to be cleaned, the creating gas bubbles comprising dissolving gas in the liquid using a gasification unit,
injecting gas into the liquid using one of a bubbler system, a capillary, a nozzle, and a membrane contactor, or
subjecting the liquid to a pressure drop, one or more compression/decompression cycles, an increase in temperature or one or more heating/cooling cycles;
creating a fixed acoustic field with the selected characteristics; and
subjecting the liquid with created bubbles to the fixed acoustic field to obtain cavitating liquid, and
subjecting the surface to be cleaned to the cavitating liquid,
wherein the range of bubble sizes is selected subsequent to and in dependence on the selection of the characteristics of the acoustic field so as to generate and control transient cavitation in the liquid near the surface to be cleaned upon subjecting the liquid with the bubbles to the fixed acoustic field.
2. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises dissolving gas in the liquid using a gasification unit.
3. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises injecting gas into the liquid using one of a bubbler system, a capillary, a nozzle, and a membrane contactor.
4. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises one of (i) subjecting the liquid to a pressure drop and (ii) subjecting the liquid to one or more compression/decompression cycles.
5. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises one of (i) subjecting the liquid to an increase in temperature and (ii) subjecting the liquid to one or more heating/cooling cycles.
6. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises introducing two or more different gases into the liquid.
7. The method of claim 1 , wherein creating gas bubbles of the selected range of bubble sizes comprises adding a surfactant to the liquid.
8. The method of claim 1 , wherein the selected range of bubble sizes is varied over time.
9. The method of claim 1 , wherein the fixed acoustic field comprises one or more frequencies.
10. The method of claim 1 , wherein the surface to be cleaned is a semiconductor substrate.
11. The method according to claim 1 , wherein the range of bubble sizes in the region subjected to the fixed acoustic field and the characteristics of the fixed acoustic field are selected so as to result in substantially uniform transient cavitation in the region.
12. The method according to claim 1 , wherein at least two different gasses are used to control the size of the bubbles.
13. The method according to claim 1 , wherein the range of bubble sizes is created by adjusting the range of bubble sizes that are present at the bottom of a tank containing the liquid, and wherein the fixed acoustic field is applied near the surface of the liquid in the tank.