IP Library Granted Patent US 7,824,960
Granted Patent B2
US 7,824,960 · App. 12/124,830 · Granted Nov 2, 2010

Method of assembling a silicon stack semiconductor package

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Quick Facts
Patent No.
US 7,824,960
App. No.
12/124,830
Granted
Nov 2, 2010
Kind
B2
Abstract

A method of manufacturing a plurality of stacked die semiconductor packages, including: placing a phase change material between a top surface of a substrate and a bottom surface of a first die; placing a phase change material between a top surface of the first die and a bottom surface of a second die; wherein the first and second dies have a plurality of conductive protrusions on the bottom surfaces of the dies; wherein the first die has a plurality of conductive vias extending from its conductive protrusions, through the first die, to the top surface of the first die; wherein the conductive vias of said first die are in alignment with the conductive protrusions of the second die; and heating the dies and the substrate to cause the second die to become electrically interconnected to the first die and the first die to become electrically connected to the substrate.

Claims (40)

1. A method of assembling a stacked semiconductor package comprising:

placing a phase change material between a top surface of a substrate and a bottom surface of a first semiconductor die;

placing a phase change material between a top surface of said first semiconductor die and a bottom surface of a second semiconductor die;

wherein said first and second semiconductor dies have a plurality of conductive protrusions on said bottom surfaces of said dies;

wherein said first semiconductor die has a plurality of conductive vias extending from its conductive protrusions, through the first semiconductor die, to the top surface of the first semiconductor die;

wherein said conductive vias of said first semiconductor die are in alignment with the conductive protrusions of the second semiconductor die; and

after placing said phase change materials, heating said semiconductor dies and said substrate to cause said second semiconductor die to become electrically interconnected to said first semiconductor die and said first semiconductor die to become electrically connected to said substrate.

2. The method of claim 1 , wherein said phase change materials evaporate during the heating step.

3. The method of claim 1 , wherein said phase change materials cure during the heating step.

4. The method of claim 1 , wherein said phase change materials are placed at the corners of said first and second semiconductor dies.

5. The method of claim 1 , wherein said phase change materials are placed at outer edges of said first and second semiconductor dies.

6. The method of claim 1 , wherein said phase change material is epoxy.

7. The method of claim 1 , wherein said heating step is a high reflow temperature process.

8. The method of claim 1 , wherein said conductive protrusions are solder bumps.

9. The method of claim 1 , further comprising encapsulating said first and second semiconductor dies and said substrate.

10. The method of claim 1 , further comprising:

prior to said heating step, placing a phase change material between a top surface of said second semiconductor die and a bottom surface of a third semiconductor die;

wherein said second semiconductor die has a plurality of conductive vias extending from its conductive protrusions, through the second semiconductor die, to the top surface of the second semiconductor die;

wherein said third semiconductor die has conductive protrusions on a bottom surface which are in alignment with the conductive vias of the second semiconductor die; and

wherein during said heating step said third semiconductor die becomes electrically interconnected to said second semiconductor die.

11. A method of assembling a stacked semiconductor package comprising:

placing a phase change material between a top surface of a substrate and a bottom surface of a first semiconductor die;

placing a phase change material between a top surface of said first semiconductor die and a bottom surface of a second semiconductor die;

wherein said first and second semiconductor dies have a plurality of conductive protrusions on said bottom surfaces of said dies;

wherein said first semiconductor die has a plurality of conductive vias extending from its conductive protrusions, through the first semiconductor die, to the top surface of the first semiconductor die;

wherein said conductive vias of said first semiconductor die are in alignment with the conductive protrusions of the second semiconductor die; and

heating said semiconductor dies and said substrate to cause said second semiconductor die to become electrically interconnected to said first semiconductor die and said first semiconductor die to become electrically connected to said substrate;

wherein the diameter of said conductive protrusions is reduced during the heating step.

12. The method of claim 11 , wherein said phase change materials cure during the heating step.

13. The method of claim 11 , wherein said phase change materials are placed at the corners of said first and second semiconductor dies.

14. The method of claim 11 , wherein said phase change materials are placed at outer edges of said first and second semiconductor dies.

15. The method of claim 11 , wherein said phase change material is epoxy.

16. The method of claim 11 , wherein said heating step is a high reflow temperature process.

17. The method of claim 11 , wherein said conductive protrusions are solder bumps.

18. The method of claim 11 , further comprising encapsulating said first and second semiconductor dies and said substrate.

19. The method of claim 11 , further comprising:

prior to said heating step, placing a phase change material between a top surface of said second semiconductor die and a bottom surface of a third semiconductor die;

wherein said second semiconductor die has a plurality of conductive vias extending from its conductive protrusions, through the second semiconductor die, to the top surface of the second semiconductor die;

wherein said third semiconductor die has conductive protrusions on a bottom surface which are in alignment with the conductive vias of the second semiconductor die; and

wherein during said heating step said third semiconductor die becomes electrically interconnected to said second semiconductor die.

Assignments (4)
CORRECTIVE ASSIGNMENT TO CORRECT THE INCLUDE PATENT NUMBER 8816482 PREVIOUSLY RECORDED AT REEL: 039885 FRAME: 0541. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 25, 2017
From: UNITED TEST AND ASSEMBLY CENTER LIMITED
To: UTAC HEADQUARTERS PTE. LTD.
Reel/Frame 043979/0820 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO ADD THE ANNEX A AND THE ANNEX B WHICH WAS INADVERTENTLY LEFTOUT IN THE ORIGINAL ASSIGNMENT DOCUMENT PREVIOUSLY RECORDED ON REEL 037959 FRAME 0822. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jul 8, 2016
From: UNITED TEST AND ASSEMBLY CENTER LIMITED
To: UTAC HEADQUARTERS PTE. LTD.
Reel/Frame 039885/0541 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2016
From: UNITED TEST AND ASSEMBLY CENTER LIMITED
To: UTAC HEADQUARTERS PTE. LTD.
Reel/Frame 037959/0822 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 7, 2008
From: HAO, LIU; KOLAN, RAVI KANTH
To: UNITED TEST AND ASSEMBLY CENTER. LTD.
Reel/Frame 021352/0597 →