Method of manufacturing a semiconductor device

1. A method of manufacturing a semiconductor device comprising:

forming a lower electrode over a substrate;

heating the substrate with the lower electrode in a mixture gas atmosphere of inert gas and oxygen gas while increasing a temperature of the substrate until the temperature of the substrate reaches a specific temperature;

forming a dielectric film with an organic metal raw material on the lower electrode after the temperature reaches the specific temperature; and

forming an upper electrode on the dielectric film,

wherein the process of forming the dielectric film includes

forming an initial layer on the lower electrode using the organic metal raw material and oxygen gas, an amount of the oxygen gas is smaller than an amount required to react with the organic metal raw material; and

forming a core layer on the initial layer using the organic metal raw material and oxygen gas, wherein the amount of the oxygen gas is larger than the amount required to react with the organic metal raw material.

2. The semiconductor device manufacturing method according to claim 1 , wherein an oxygen gas rate in the mixture gas atmosphere is set to 30% or less.

3. The semiconductor device manufacturing method according to claim 2 , wherein the oxygen gas rate is equal to 10% to 20%.

4. The semiconductor device manufacturing method according to claim 3 , wherein the oxygen gas rate is equal to about 15%.

5. The semiconductor device manufacturing method according to claim 1 , wherein the initial layer has a film thickness of 3 nm to 12 nm.

6. The semiconductor device manufacturing method according to claim 1 , wherein the initial layer is formed at a forming speed of 0.1 nm/second or less.

7. The semiconductor device manufacturing method according to claim 1 , wherein the core layer contains a larger amount of oxygen than the initial layer.

8. The semiconductor device manufacturing method according to claim 1 , wherein the step of forming the dielectric film includes forming an amorphous dielectric surface layer portion on the core layer.

9. The semiconductor device manufacturing method according to claim 8 , wherein the amorphous dielectric surface layer portion is formed by a sputtering method.

10. The semiconductor device manufacturing method according to claim 1 , wherein after the dielectric film is formed, a heat treatment is conducted under an oxygen gas contained atmosphere.

11. The semiconductor device manufacturing method according to claim 1 , wherein the lower electrode contains at least one of Ir, Rh, Pd and Ru.

12. The semiconductor device manufacturing method according to claim 1 , wherein the step of forming the lower electrode includes forming a first metal film and forming a metal oxide film which is in amorphous or microcrystalline state on the first metal film.

13. The semiconductor device manufacturing method according to claim 12 , wherein the dielectric film is formed on the metal oxide film while reducing the metal oxide film to a second metal film.

14. The semiconductor device manufacturing method according to claim 12 , wherein the metal oxide film is a noble metal oxide film containing at least one of Ir, Rh, Pd and Ru.

15. The semiconductor device manufacturing method according to claim 1 , wherein the specific temperature is substantially the same as the temperature at which the dielectric film is formed.

16. The semiconductor device manufacturing method according to claim 1 , wherein the dielectric film is a ferroelectric film.

17. The semiconductor device manufacturing method according to claim 16 , wherein the ferroelectric film contains Pb or Bi.

18. The semiconductor device manufacturing method according to claim 1 , wherein the lower electrode is electrically connected to a transistor.