Method for manufacturing semiconductor device
View Patent ↗On a surface of a Si substrate, a nonvolatile memory cell, an nMOS transistor, and a pMOS transistor are formed, and thereafter an interlayer insulation film covering the nonvolatile memory cell, the nMOS transistor, and the pMOS transistor is formed. Next, in the interlayer insulation film, there are formed plural contact plugs connected respectively to a control gate of the nonvolatile memory cell, a source or a drain of the nMOS transistor, and a source or a drain of the pMOS transistor. Thereafter, there is formed a single-layer wiring connecting the control gate to the sources or drains of the nMOS transistor and the pMOS transistor via the plural contact plugs.
1. A method for manufacturing a semiconductor device, comprising:
forming a nonvolatile memory cell on a surface of a semiconductor substrate;
forming copper wirings as a plurality of upper wirings connecting a control gate of the nonvolatile memory cell to protective diodes; and
forming a diffusion prevention film of the copper wirings, said diffusion prevention film including at least silicon and nitrogen.
2. A method for forming a semiconductor device, comprising:
forming a nonvolatile memory cell on a surface of a semiconductor substrate;
forming a low dielectric constant film as an interlayer insulation film and forming a plurality of upper wirings connecting a control gate of the nonvolatile memory cell to protective diodes; and
forming a diffusion prevention film of the upper wirings, said diffusion prevention film including at least silicon and nitrogen.
3. The method for manufacturing a semiconductor device according to claim 1 , wherein a protective diode is formed on the surface of the semiconductor substrate, along with the nonvolatile memory cell.
4. The method for manufacturing a semiconductor device according to claim 2 , wherein a protective diode is formed on the surface of the semiconductor substrate, along with the nonvolatile memory cell.
5. The method for manufacturing a semiconductor device according to claim 3 , wherein the protective diode has an nMOS transistor and a pMOS transistor.
6. The method for manufacturing a semiconductor device according to claim 4 , wherein the protective diode has an nMOS transistor and a pMOS transistor.
7. The method for manufacturing a semiconductor device according to claim 5 , wherein, with regard to the protective diode, a source or a drain having an n + diffusion layer of the nMOS transistor is formed in a p-well, and a source or a drain having a p + diffusion layer of the pMOS transistor is formed in an n-well.
8. The method for manufacturing a semiconductor device according to claim 6 , wherein, with regard to the protective diode, a source or a drain having an n + diffusion layer of the nMOS transistor is formed in a p-well, and a source or a drain having a p + diffusion layer of the pMOS transistor is formed in an n-well.
9. A method for manufacturing a semiconductor device, comprising:
forming a nonvolatile memory cell and a protective diode on a surface of a semiconductor substrate;
forming a single-layer copper wiring connecting a control gate of the nonvolatile memory cell and a diffusion layer of the protective diode; and
forming a diffusion prevention film of the copper wirings, said diffusion prevention film including at least silicon and nitrogen.
10. The method for manufacturing a semiconductor device according to claim 9 , wherein the protective diode has an nMOS transistor and a pMOS transistor.
11. The method for manufacturing a semiconductor device according to claim 10 , wherein, with regard to the protective diode, a source or a drain having an n + diffusion layer of the nMOS transistor is formed in a p-well, and a source or a drain having a p + diffusion layer of the pMOS transistor is formed in an n-well.