IP Library Granted Patent US 7,998,332
Granted Patent B2
US 7,998,332 · App. 12/164,429 · Granted Aug 16, 2011

Electroplating method

Assignees: FuKui Precision Component (Shenzhen) Co., Ltd.; Foxconn Advanced Technology Inc.
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Quick Facts
Patent No.
US 7,998,332
App. No.
12/164,429
Granted
Aug 16, 2011
Kind
B2
Abstract

An electroplating method includes steps of: providing a substrate having a first portion and a second portion connected to the first portion; forming a metallic layer on a surface of the second portion; immersing the first portion of the substrate in an electrolyte solution, applying a current to the metallic layer to electroplate the first portion of the substrate with a metal layer; and moving the substrate in a direction away from the electrolyte solution during electroplating the first portion of the substrate. The method can improve a uniformity of the obtained plating layer.

Claims (13)

1. An electroplating method comprising:

providing a substrate comprising a first portion and a second portion connected to the first portion;

forming a metallic layer on a surface of the second portion; and

immersing only the first portion of the substrate in an electrolyte solution,

applying a current to the metallic layer on the second portion to electroplate the first portion of the substrate with a metal layer; and

moving the substrate in a direction away from the electrolyte solution during electroplating the first portion of the substrate, wherein the substrate is comprised of carbon fibers.

2. The electroplating method as claimed in claim 1 , wherein the metallic layer on the second portion is formed by applying an electrically conductive paste on the surface of the second portion.

3. The electroplating method as claimed in claim 2 , wherein the electrically conductive paste is comprised of silver, gold, copper, nickel, aluminum and an alloy thereof.

4. The electroplating method as claimed in claim 1 , wherein the metallic layer is formed by applying metal powders on the second portion.

5. The electroplating method as claimed in claim 1 , wherein the metallic layer is a metal plate attached to the second portion.

6. The electroplating method as claimed in claim 1 , wherein the substrate is moved in an uniform rectilinear motion.

7. The electroplating method as claimed in claim 1 , wherein the current applied to the metallic layer decreases at an acceleration of vI 0 /L, wherein v represents a moving velocity of the substrate, I 0 represents an initial current applied to the metallic layer, and L represents a length of the first portion.

8. The electroplating method as claimed in claim 1 , further comprising a step of removing the second portion from the substrate.

Assignments (2)
CHANGE OF NAME Recorded Sep 13, 2011
From: FOXCONN ADVANCED TECHNOLOGY INC.
To: ZHEN DING TECHNOLOGY CO., LTD.
Reel/Frame 026891/0113 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 30, 2008
From: LIOU, SHING-TZA; BAI, YAO-WEN; ZHANG, RUI; ZHANG, QIU-YUE
To: FUKUI PRECISION COMPONENT (SHENZHEN) CO., LTD.; FOXCONN ADVANCED TECHNOLOGY INC.
Reel/Frame 021170/0826 →
Priority Claims (1)
CN 2007 1 0203211 · Dec 19, 2007 · national
Continuity (1)
Related Publication 20090159452A1 · Jun 25, 2009