IP Library › Granted Patent US 8,357,874
Granted Patent B2
US 8,357,874 · App. 12/178,372 · Granted Jan 22, 2013

Radio frequency power supply

Inventors: Thomas Kirchmeier (Teningen, DE); Hans-Juergen Windisch (Ehrenkirchen, DE); Hanns-Joachim Knaus (Emmendingen, DE); Michael Glueck (Freiburg, DE)
Assignee: Huettinger Elektronik GmbH + Co. KG
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Quick Facts
Patent No.
US 8,357,874
App. No.
12/178,372
Granted
Jan 22, 2013
Kind
B2
Abstract

A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Claims (30)

1. A plasma supply device comprising:

a full bridge circuit connectable to a DC power supply, the full bridge including two half bridges, each half bridge including two switching elements connected in series via a center between the switching elements; and

a power transformer with a primary winding connected to the centers of the half bridges,

wherein the primary winding comprises a tapping connectable to a potential between two potentials of the DC power supply.

2. The plasma supply device of claim 1 , wherein the tapping of the primary winding is provided in the center of the primary winding.

3. The plasma supply device of claim 1 , further comprising a voltage divider and wherein two ends of the voltage divider are connectable to the two potentials of the DC power supply and a third connection of the voltage divider is connected to the tapping.

4. The plasma supply device of claim 3 , wherein the voltage divider comprises at least one resistor and/or capacitor.

5. The plasma supply device of claim 1 , further comprising a first inductance or a capacitor connected to the tapping and connectable to an alternating current center of the DC power supply.

6. The plasma supply device of claim 1 , further comprising an oscillatory circuit connected to the tapping and connectable to an alternating current center of the DC power supply.

7. The plasma supply device of claim 1 , further comprising an auxiliary inductance between at least one of the centers of the half bridges and at least one connection of the primary winding.

8. The plasma supply device of claim 1 , further comprising an auxiliary inductance connected in parallel to the primary winding.

9. The plasma supply device of claim 1 , wherein the plasma supply device is configured for operation at frequencies of at least 3 MHz and a DC power supply voltage larger than 100 V.

10. The plasma supply device of claim 1 , wherein a power larger than 10 kW can be generated with the plasma supply device.

11. A method for operating a plasma supply device including a DC power supply, a full bridge with four switching elements, and a power transformer connected to the full bridge and including a primary winding with a tapping, the method comprising:

zero-voltage switching of at least some of the switching elements;

regulating a power by phase shifting;

providing an alternating current center between the potentials of the DC power supply; and

applying the alternating current center to the tapping of the primary winding.

12. The method of claim 11 , wherein the tapping is located at a center of the primary winding.

13. The method of claim 11 , wherein the alternating current center is applied via a coil or an oscillatory circuit to the tapping.

14. The method of claim 11 , wherein the alternating current center is provided by a voltage divider including capacitors.

15. The method of claim 14 , wherein bypass capacitors of the half bridges forming the full bridge are used as the voltage divider.

16. The method of claim 11 , wherein a power greater than 10 kW is generated.

17. A system comprising:

a DC power supply; and

a plasma supply device including a full bridge circuit connected to the DC power supply, the full bridge including two half bridges, each half bridge including two switching elements connected in series via a center between the switching elements, and a power transformer with a primary winding connected to the centers of the half bridges,

wherein the primary winding comprises a tapping connected to a potential between two potentials of the DC power supply.

18. The system of claim 17 , wherein the plasma supply device further comprises a voltage divider and wherein two ends of the voltage divider are connectable to the two potentials of the DC power supply and a third connection of the voltage divider is connected to the tapping.

19. The system of claim 18 , wherein the voltage divider comprises at least one resistor and/or capacitor.

20. The system of claim 17 , wherein the plasma supply device further comprises an oscillatory circuit connected to the tapping and connectable to an alternating current center of the DC power supply.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 1, 2008
From: KIRCHMEIER, THOMAS; WINDISCH, HANS-JUERGEN; KNAUS, HANNS-JOACHIM; GLUECK, MICHAEL
To: HUETTINGER ELEKTRONIK GMBH + CO. KG
Reel/Frame 021614/0222 →
Priority Claims (1)
WO PCT/EP2008/004651 · Jun 11, 2008 · international
Continuity (2)
Provisional Application 60951392 · Jul 23, 2007
Related Publication 20090026181A1 · Jan 29, 2009