Aberration corrector and charged particle beam apparatus using the same

1. An aberration corrector, having a multipole element member that a first electrode and a second electrode both being made up of a metal material are integrated into a single piece by brazing the electrodes so as to sandwich a ceramic material in a vertical direction, and

a support base that has an aperture part allowing a charged particle beam to pass through in its center part and is for fixing the plurality of multipole element members,

wherein multistage multipoles constructed by fixing the plurality of multipole element members around the aperture part is used.

2. The aberration corrector according to claim 1 ,

wherein the multistage multipole is an electromagnetic field superposition type multipole that is constructed by using an electrode made up of a non-magnetic metal as the first electrode and using a magnetic pole made up of a soft magnetic metal as the second electrode.

3. The aberration corrector according to claim 1 ,

wherein the multistage multipole is an electric field type multipole each of which is constructed by using an electrode made up of a non-magnetic metal as the first electrode and as the second electrode.

4. The aberration corrector according to claim 1 ,

wherein the multistage multipole is magnetic field type multipole each of which is constructed by using a magnetic pole that includes the first electrode and the second electrode each being made up of a soft magnetic metal.

5. The aberration corrector according to claim 2 ,

wherein the non-magnetic metal is made up of a titanium material.

6. The aberration corrector according to claim 3 ,

wherein the non-magnetic metal is made up of a titanium material.

7. The aberration corrector according to claim 2 ,

wherein the soft magnetic metal is any one of a Permalloy, pure iron, and a permendur.

8. The aberration corrector according to claim 4 ,

wherein the soft magnetic metal is any one of a Permalloy, pure iron, and a permendur.

9. The aberration corrector according to claim 1 ,

wherein a groove to which the multipole element member fits is formed on the surface of the support base, and one sidewall of the groove serves as a base level where the multipole element member is aligned.

10. The aberration corrector according to claim 1 ,

wherein tip shapes of the first electrode and the second electrode are wedges, and angles of the wedge-shaped tips range from 15° to 25°.

11. A charged particle beam apparatus that has a specimen stage on which a specimen is placed and held, and a charged particle beam optical system equipped with a function of irradiating a primary charged particle beam on the specimen, detecting secondary charged particles generated by the irradiation, and outputting a signal,

wherein the charged particle beam optical system is equipped with lens means for deflecting or converging the charged particle beam and an aberration corrector for correcting aberration generated by the lens means, and

the aberration corrector has a multipole element member that is integrated into a single piece by brazing a first electrode and a second electrode made up of a metal material in a vertical direction with a ceramic material interposed therebetween, and a support base that has an aperture part allowing the charged particle beam to pass through in its central part and is for fixing the plurality of multipole element members, and has a multistage multipole constructed by fixing the plurality of multipole element members around the aperture part.

12. The charged particle beam apparatus according to claim 11 ,

wherein the charged particle optical system is equipped with an electron gun for generating an electron beam and a scanning deflector for scanning the charged particle beam on the specimen,

the aberration corrector has a four-stage multipole constructed by fixing a plurality of multipole element members to the both sides of the support base, and

the multipole that is near to the support base among the four-stage multipoles is an electromagnetic field superposition type multipole.

13. The charged particle beam apparatus according to claim 12 ,

wherein all the multipoles other than the electromagnetic superposition type multipole among a plurality of multipoles that constitute the four-stage multipole are magnetic field type multipole.

14. The charged particle beam apparatus according to claim 11 ,

wherein the charged particle optical system is equipped with an ion gun for generating an ion beam, and

the aberration corrector is constructed with only an electric field type multipole such that the first electrode and the second electrode are all made up of a non-magnetic material.

15. The charged particle beam apparatus according to claim 11 ,

wherein the aberration corrector is equipped with a structure where a plurality of the multistage multipoles are further accumulated.

16. A scanning electron microscope that has a specimen mount on which a specimen is placed and held, and an electron optics column equipped with a function that irradiates an electron beam on the specimens, detects secondary electrons or reflected electrons generated by the irradiation, and outputs a signal,

wherein the electron optics column is equipped with lens means for deflecting or converging the electron beam and an aberration corrector for correcting aberration generated by the lens means, and

the aberration corrector is equipped with a multipole element member that integrates a first electrode and a second electrode made up of a metal material in a vertical direction with a medium of a ceramic material by brazing and a support base that has an aperture part allowing the electron beam to pass through its central part and is for fixing the plurality of multipole element member, and is equipped with multistage multipole each of which is constructed by fixing the plurality of multipole element members around the aperture part.