IP Library Granted Patent US 7,732,792
Granted Patent B2
US 7,732,792 · App. 12/188,791 · Granted Jun 8, 2010

Pattern measurement apparatus

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Quick Facts
Patent No.
US 7,732,792
App. No.
12/188,791
Granted
Jun 8, 2010
Kind
B2
Abstract

Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

Claims (16)

1. A pattern measurement apparatus, comprising:

a control unit for performing an image processing of an image acquired by a scanning electron microscope; wherein

said control unit

adds identification information to each of fragments which constitute a pattern within said image acquired by said scanning electron microscope, and

stores information on each fragment to which said identification information is added, said identification information being added to each fragment for distinguishing between one fragment and another fragment.

2. The pattern measurement apparatus according to claim 1 , wherein

said control unit adds said identification information to each fragment based on design data on said sample.

3. The pattern measurement apparatus according to claim 1 , wherein

said control unit adds said identification information to each fragment based on positions within a field-of-view of said image acquired by said scanning electron microscope.

4. The pattern measurement apparatus according to claim 3 , wherein

said control unit adds said identification information to each fragment based on design data on said sample.

5. A pattern measurement apparatus, comprising:

a control unit for performing an image processing of an image acquired by a scanning electron microscope; wherein

said control unit

adds identification information to each of fragments which constitute a pattern within said image acquired by said scanning electron microscope, said identification information being added to each fragment for distinguishing between one fragment and another fragment, and

mutually connects adjacent field-of-views of said scanning electron microscope to each other in such a manner that said fragments having identification information which is common to said adjacent field-of-views are mutually connected to each other.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 8, 2008
From: MATSUOKA, RYOICHI; ONIZAWA, AKIHIRO; SUGIYAMA, AKIYUKI; MOROKUMA, HIDETOSHI; TOYODA, YASUTAKA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 021693/0855 →