Resist removing method and resist removing apparatus
View Patent ↗In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.
1. A resist removing method comprising the steps of:
(a) supplying sulfuric acid and hydrogen peroxide water to a surface of a substrate to remove a resist from the substrate surface; and
(b) supplying hydrogen peroxide water to the substrate surface after step (a) to remove the sulfuric acid and the hydrogen peroxide water supplied at step (a) from the substrate surface, wherein
at step (b), the sulfuric acid remaining at the surface of the substrate chemically reacts with the hydrogen peroxide water supplied at step (b) into Caro's acid, and the sulfuric acid and the hydrogen peroxide water remaining at the surface of the substrate are replaced with the hydrogen peroxide water supplied at step (b).
2. A resist removing method as set forth in claim 1 , wherein
the sulfuric acid/hydrogen peroxide water supplying step includes the step of supplying a mixture of the sulfuric acid and the hydrogen peroxide water to the substrate surface from a mixture nozzle, and
the hydrogen peroxide water supplying step includes the step of supplying the hydrogen peroxide water to the substrate surface from a hydrogen peroxide water nozzle.
3. A resist removing method as set forth in claim 1 , wherein
the sulfuric acid/hydrogen peroxide water supplying step includes the step of supplying a mixture of the sulfuric acid and the hydrogen peroxide water to the substrate surface from a mixture nozzle, and
the hydrogen peroxide water supplying step includes the step of supplying the hydrogen peroxide water to the substrate surface from the mixture nozzle.
4. A resist removing method as set forth in claim 3 , wherein
the hydrogen peroxide water supplying step follows the sulfuric acid/hydrogen peroxide water supplying step, and
the amount of the sulfuric acid contained in a liquid spouted from the mixture nozzle is reduced, so that only the hydrogen peroxide water is finally spouted from the mixture nozzle in the hydrogen peroxide water supplying step.
5. A resist removing method as set forth in claim 4 , wherein as the hydrogen peroxide water supplying step proceeds, the temperature of the liquid spouted from the mixture nozzle is reduced.
6. A resist removing method comprising the steps of:
supplying sulfuric acid and hydrogen peroxide water to a surface of a substrate to remove a resist from the substrate surface; and
supplying hydrogen peroxide water to the substrate surface after the sulfuric acid/hydrogen peroxide water supplying step to remove the sulfuric acid and the hydrogen peroxide water supplied in the sulfuric acid/hydrogen peroxide water supplying step from the substrate surface, wherein
sulfuric acid adhering to the surface of the substrate chemically reacts with the hydrogen peroxide water into Caro's acid in the hydrogen peroxide water supplying step.
7. A resist removing method as set forth in claim 6 , wherein
the sulfuric acid/hydrogen peroxide water supplying step includes the step of supplying a mixture of the sulfuric acid and the hydrogen peroxide water to the substrate surface from a mixture nozzle, and
the hydrogen peroxide water supplying step includes the step of supplying the hydrogen peroxide water to the substrate surface from the mixture nozzle.
8. A resist removing method as set forth in claim 7 , wherein
the hydrogen peroxide water supplying step follows the sulfuric acid/hydrogen peroxide water supplying step, and
the amount of the sulfuric acid contained in a liquid spouted from the mixture nozzle is reduced, so that only the hydrogen peroxide water is finally spouted from the mixture nozzle in the hydrogen peroxide water supplying step.
9. A resist removing method as set forth in claim 6 , wherein
the sulfuric acid/hydrogen peroxide water supplying step includes the step of supplying a mixture of the sulfuric acid and the hydrogen peroxide water to the substrate surface from a mixture nozzle, and
the hydrogen peroxide water supplying step includes the step of supplying the hydrogen peroxide water to the substrate surface from a hydrogen peroxide water nozzle.
10. A resist removing method as set forth in claim 9 , wherein
as the hydrogen peroxide water supplying step proceeds, the temperature of the liquid spouted from the mixture nozzle is reduced.