Metal gate transistor and method for fabricating the same
View Patent ↗A method for fabricating a transistor having metal gate is disclosed. First, a substrate is provided, in which the substrate includes a first transistor region and a second transistor region. A plurality of dummy gates is formed on the substrate, and a dielectric layer is deposited on the dummy gate. The dummy gates are removed to form a plurality of openings in the dielectric layer. A high-k dielectric layer is formed to cover the surface of the dielectric layer and the opening, and a cap layer is formed on the high-k dielectric layer thereafter. The cap layer disposed in the second transistor region is removed, and a metal layer is deposited on the cap layer of the first transistor region and the high-k dielectric layer of the second transistor region. A conductive layer is formed to fill the openings of the first transistor region and the second transistor region.
1. A method for fabricating metal gate transistor, comprising:
providing a substrate having a first transistor region and a second transistor region;
forming a plurality of dummy gates on the substrate and within the first transistor region and the second transistor region;
forming a source/drain region at two sides of each dummy gate;
forming a dielectric layer to cover the dummy gates;
removing the dummy gates to form a plurality of openings in the dielectric layer of the first transistor region and the second transistor region;
forming a high-k dielectric layer to cover the dielectric layer and surface of each opening;
depositing a first cap layer on the high-k dielectric layer;
removing the first cap layer disposed in the second transistor region; and
forming a metal layer on the first cap layer of the first transistor region and the high-k dielectric layer of the second transistor region.
2. The method of claim 1 , wherein the first transistor region is a NMOS transistor region.
3. The method of claim 2 , wherein the first cap layer comprises LaO, MgO, Dy 2 O 3 , or other lanthanide oxides.
4. The method of claim 1 , wherein the second transistor region is a PMOS transistor region.
5. The method of claim 4 , further comprising forming a second cap layer in the second transistor region after removing the first cap layer from the second transistor region.
6. The method of claim 5 , wherein the second cap layer comprises Al 2 O 3 , AlN, or AlON.
7. The method of claim 1 , wherein the metal layer comprises TiN, TaC, Ta, TaSiN, Al, or TiAlN.
8. The method of claim 1 , further comprising performing a first chemical mechanical polishing process after forming the dielectric layer and before removing the dummy gate.
9. The method of claim 1 , further comprising:
forming a conductive layer to fill the openings of the first transistor region and the second transistor region after forming the metal layer on the first cap layer of the first transistor region and the high-k dielectric layer of the second transistor region; and
performing a second chemical polishing after forming the conductive layer.
10. The method of claim 1 , wherein the high-k dielectric layer comprises HfSiO, HfSiON, HfO, LaO, LaAlO, ZrO, ZrSiO, or HfZrO.
11. The method of claim 9 , wherein the conductive layer comprises Al, W, TiAl or CoWP.