Method for automatically de-skewing of multiple layer wafer for improved pattern recognition
View Patent ↗A method for processing wafers includes learning a first pattern at a de-skew site on a first wafer layer, saving the first patterns in a recipe for de-skewing wafers, learning a second pattern at the de-skew site a second wafer layer, and saving the second pattern in the same recipe for de-skewing wafers. Learning the first pattern may include determining a score of uniqueness for the first pattern. The method further includes finding the de-skew site on the second wafer layer using the first pattern before learning the second pattern. Finding the de-skew site includes determining a score of similarity between the first pattern and the second pattern. Learning the second pattern is performed when the score of similarity is less than a threshold value. A recipe for de-skewing wafers includes multiple patterns of a de-skew site of a wafer, wherein the patterns include a first pattern at the de-skew site on a first wafer layer and a second pattern at the de-skew site on a second wafer layer.
1. A computer implemented method comprising:
receiving by a computer a pattern of a first de-skew site on a layer on a wafer;
finding in the computer a match of the pattern with one of a plurality of learned patterns in a recipe, wherein the recipe includes a first set of coordinates of the first de-skew site and the plurality of learned patterns includes learned patterns of the first de-skew site for different layers;
determining in the computer a second set of coordinates of a second de-skew site on the layer;
determining in the computer a transforming matrix from the first and the second sets of coordinates of the first and the second de-skew sites; and
using the transforming matrix to de-skew the wafer.
2. The method of claim 1 , wherein the recipe further includes the second set of coordinates of the second de-skew site and a second plurality of learned patterns of the second de-skew site.
3. The method of claim 1 , wherein the plurality of learned patterns includes at least one common learned pattern of the first de-skew site for a plurality of layers on the wafer.
4. The method of claim 3 , further comprising:
receiving a second pattern of the first de-skew site on a second layer on the wafer;
finding a match of the second pattern with the common learned pattern in the recipe;
determining the second set of coordinates of the second de-skew site on the second layer;
determining a second transforming matrix from the first and the second sets of coordinates of the de-skew site on the second wafer layer; and
using the second transforming matrix to de-skew the wafer.
5. The method of claim 1 , further comprising:
receiving a second pattern of the first de-skew site on a second layer on the wafer;
finding a match of the second pattern with one of the plurality of learned patterns in the recipe;
determining the second set of coordinates of the second de-skew site on the second layer;
determining a second transforming matrix from the first and the second sets of coordinates of the de-skew site on the second wafer layer; and
using the second transforming matrix to de-skew the wafer.
6. A computer implemented method comprising:
receiving by a computer a de-skew pattern at a first de-skew site on a layer on a wafer;
finding in the computer a match of the de-skew pattern with a learned pattern in a recipe, wherein the recipe includes a first set of coordinates of the first de-skew site and the learned pattern, the learned pattern matching a plurality of patterns at the first de-skew site on a plurality of layers on the wafer;
determining in the computer a second set of coordinates of a second de-skew site on the layer;
determining in the computer a transforming matrix from the first and the second sets of coordinates of the first and the second de-skew sites; and
using the transforming matrix to de-skew the wafer.
7. The method of claim 6 , wherein the recipe further includes the second set of coordinates of the second de-skew site and a second plurality of learned patterns of the second de-skew site.
8. The method of claim 6 , wherein the learned pattern in the recipe is a first learned pattern, the recipe further includes at least one additional learned pattern matching the pattern at the first de-skew site on a layer of the wafer that is not matched by the first learned pattern.
9. The method of claim 8 , further comprising:
receiving a second de-skew pattern at the first de-skew site on a second layer on the wafer;
finding a match of the second de-skew pattern with the at least one additional learned pattern in the recipe;
determining the second set of coordinates of the second de-skew site on the second layer;
determining a second transforming matrix from the first and the second sets of coordinates of the de-skew site on the second wafer layer; and
using the second transforming matrix to de-skew the wafer.
10. The method of claim 6 , further comprising:
receiving a second de-skew pattern at the first de-skew site on a second layer on the wafer;
finding a match of the second de-skew pattern with the learned pattern in the recipe;
determining the second set of coordinates of the second de-skew site on the second layer;
determining a second transforming matrix from the first and the second sets of coordinates of the de-skew site on the second wafer layer; and
using the second transforming matrix to de-skew the wafer.